公开(公告)号：US20160249442A1

公开(公告)日：2016-08-25

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/003 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/008

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

Abstract translation: 本公开涉及基于等离子体的光源。 描述了用于保护光源的组分的等离子体产生的碎片的系统和方法，其可以包括目标材料气体，原子蒸汽，高能离子，中性粒子，微粒子和污染物。 具体实施方案包括用于减少等离子体产生的离子和中性物质对光源组分的不利影响的装置，同时减少由于目标材料气体和蒸汽引起的带内光衰减。

公开(公告)号：US10034362B2

公开(公告)日：2018-07-24

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00 ,  G03F7/20

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.