公开(公告)号：US09224195B2

公开(公告)日：2015-12-29

申请号：US14223709

申请日：2014-03-24

Applicant: KLA-Tencor Corporation

Inventor： Bing Li ,  Weimin Ma ,  Joseph M. Blecher

IPC: G06T7/00 ,  G01N21/956

CPC classification number: G06T7/0002 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/001 ,  G06T2207/30148

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A stream of defect data is received from a reticle inspection system, wherein the defect data identifies a plurality of defects that were detected for a plurality of different portions of the reticle. Before reviewing the defect data to determine whether the reticle passes inspection and as the stream of defect data continues to be received, some of the defects are automatically grouped with other most recently one or more received defects so as form groups of substantially matching defects. Before reviewing the defect data to determine whether the reticle passes inspection and after all of the defect data for the reticle is received, one or more of the groups of defects that have a number above a predetermined threshold are automatically filtered from the defect data so as to form filtered defect data. The filtered defect data may then be provided to a review station for determining whether the reticle passes.

Abstract translation: 公开了用于检查光刻掩模版的方法和装置。 从掩模版检查系统接收缺陷数据流，其中缺陷数据识别针对掩模版的多个不同部分检测到的多个缺陷。 在检查缺陷数据以确定掩模版是否通过检查并且随着缺陷数据流继续被接收之后，一些缺陷自动与其他最近一个或多个接收到的缺陷分组，以便形成基本上匹配的缺陷的组。 在检查缺陷数据以确定掩模版是否通过检查之前，并且在接收到所有掩模版的缺陷数据之后，从缺陷数据中自动过滤具有高于预定阈值的数量的缺陷组中的一个或多个，以便 以形成过滤的缺陷数据。 然后可以将过滤的缺陷数据提供给审查站，以确定标线是否通过。

公开(公告)号：US20140205179A1

公开(公告)日：2014-07-24

申请号：US14223709

申请日：2014-03-24

Applicant: KLA-Tencor Corporation

Inventor： Bing Li ,  Weimin Ma ,  Joseph M. Blecher

IPC: G06T7/00

CPC classification number: G06T7/0002 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/001 ,  G06T2207/30148

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A stream of defect data is received from a reticle inspection system, wherein the defect data identifies a plurality of defects that were detected for a plurality of different portions of the reticle. Before reviewing the defect data to determine whether the reticle passes inspection and as the stream of defect data continues to be received, some of the defects are automatically grouped with other most recently one or more received defects so as form groups of substantially matching defects. Before reviewing the defect data to determine whether the reticle passes inspection and after all of the defect data for the reticle is received, one or more of the groups of defects that have a number above a predetermined threshold are automatically filtered from the defect data so as to form filtered defect data. The filtered defect data may then be provided to a review station for determining whether the reticle passes.

Abstract translation: 公开了用于检查光刻掩模版的方法和装置。 从掩模版检查系统接收缺陷数据流，其中缺陷数据识别针对掩模版的多个不同部分检测到的多个缺陷。 在检查缺陷数据以确定掩模版是否通过检查并且随着缺陷数据流继续被接收之后，一些缺陷自动与其他最近一个或多个接收到的缺陷分组，以便形成基本上匹配的缺陷的组。 在检查缺陷数据以确定掩模版是否通过检查之前，并且在接收到所有掩模版的缺陷数据之后，从缺陷数据中自动过滤具有高于预定阈值的数量的缺陷组中的一个或多个，以便 以形成过滤的缺陷数据。 然后可以将过滤的缺陷数据提供给审查站，以确定标线是否通过。