公开(公告)号：US09239295B2

公开(公告)日：2016-01-19

申请号：US13857744

申请日：2013-04-05

Applicant: KLA-Tencor Corporation

Inventor： Xianzhao Peng ,  Mark Shi Wang ,  Grace Hsiu-Ling Chen

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N2021/8848

Abstract: Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).

Abstract translation: 提供了用于可变偏振晶片检查的方法和系统。 一个系统包括一个或多个偏振组件，位于从晶片散射的光的一个或多个路径中，并由检查系统的一个或多个通道检测。 偏振分量被配置为具有从偏振分量的两个或更多个偏振设置中选择的检测极化。

公开(公告)号：US20130265577A1

公开(公告)日：2013-10-10

申请号：US13857744

申请日：2013-04-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Xianzhao Peng ,  Mark Shi Wang ,  Grace Hsiu-Ling Chen

IPC: G01N21/21

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N2021/8848

Abstract: Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).

Abstract translation: 提供了用于可变偏振晶片检查的方法和系统。 一个系统包括一个或多个偏振组件，位于从晶片散射的光的一个或多个路径中，并由检查系统的一个或多个通道检测。 偏振分量被配置为具有从偏振分量的两个或更多个偏振设置中选择的检测极化。