公开(公告)号：US20180212612A1

公开(公告)日：2018-07-26

申请号：US15747734

申请日：2016-07-29

Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jong Cheol PARK ,  Hee Yeoun KIM ,  Chung Mo YANG ,  Tae Hyun KIM

IPC: H03L7/26 ,  G04F5/14 ,  H01L21/02

CPC classification number: H03L7/26 ,  B81B7/0038 ,  B81C2203/0118 ,  B81C2203/031 ,  G04F5/14 ,  H01L21/02532 ,  H03L1/04

Abstract: According to the present invention, since a silicon body itself supporting first and second glass substrates also has a role of an electric heating device, the temperature of the inside of a through-part can be maintained to be constant. In addition, since it is unnecessary to comprise a separate electric heating device such as a heater or to form an additional heating pattern in order to control the temperature of the inside of the through-part, a process for manufacturing a vapor cell can be simplified. According to the present invention, only a reactive material in a gas state and a buffer gas can be injected into a sealed container without the intervention of other materials, and the size of the sealed container can be reduced since it is unnecessary to prepare e separate space for mounting a pill of the reaction material in a vapor cell region itself.