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1.发明授权公开(公告)号：US09272917B2
公开(公告)日：2016-03-01
申请号：US13677194
申请日：2012-11-14
发明人： Han Kwon Chang , Hee Dong Jang
CPC分类号： C01B33/18 , C01P2004/32 , C01P2006/16
摘要： Disclosed is a method of preparing mesoporous silica particles. The method includes (a) preparing an aqueous silicic acid, (b) spraying the aqueous silicic acid in a droplet state by activating the aqueous silicic acid, and (c) pyrolyzing the sprayed droplet through a reactor, which is previously heated, by allowing the sprayed droplet to pass through the reactor together with a carrier gas. The aqueous silicic acid includes 0.4 M to 0.8 M of silicic acid.
摘要翻译： 公开了一种制备介孔二氧化硅颗粒的方法。 该方法包括（a）制备硅酸水溶液，（b）通过活化硅酸水溶液喷雾液体状态的硅酸，和（c）通过允许已加热的反应器将喷雾的液滴热解， 喷雾的液滴与载气一起通过反应器。 硅酸水溶液含有0.4M〜0.8M的硅酸。
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公开(公告)号：US20140141163A1
公开(公告)日：2014-05-22
申请号：US14077982
申请日：2013-11-12
发明人： Jiwoong Kim , Hee Dong Jang , Han Kwon Chang
IPC分类号： C01B33/12
CPC分类号： C01B33/128 , C01B33/193 , C01P2004/34 , C01P2004/61 , Y10T428/2982 , Y10T428/2984 , Y10T428/2989 , Y10T428/2991
摘要： Disclosed is a method of synthesizing hollow silica having the size of micrometers from sodium silicate. The method includes fabricating a polystyrene organic template from polystyrene latex, (B) cleaning the polystyrene organic template, (C) exchanging media by using a water-base medium, introducing the cleaned polystyrene organic template and sodium silicate, and preparing a silica-coated organic template by performing an acidic hydrolysis reaction, and (D) cleaning the silica-coated organic template included in the water-base medium by using water. The size of the organic template is adjusted by controlling an amount of introduced AIBN included when the organic template is fabricated. The cleaning of the organic template is preferably performed by using water (H2O). The method further includes (B) removing the organic template by using THF and (F) cleaning the hollow silica having no organic template.
摘要翻译： 公开了一种从硅酸钠合成尺寸为微米的中空二氧化硅的方法。 该方法包括由聚苯乙烯胶乳制造聚苯乙烯有机模板，（B）清洗聚苯乙烯有机模板，（C）通过使用水基介质，引入清洁的聚苯乙烯有机模板和硅酸钠来交换介质，以及制备二氧化硅涂覆 通过进行酸性水解反应的有机模板，和（D）使用水清洗包含在水基介质中的二氧化硅涂覆的有机模板。 通过控制当制造有机模板时包括的引入的AIBN的量来调节有机模板的尺寸。 有机模板的清洁优选通过使用水（H 2 O）进行。 该方法还包括（B）通过使用THF除去有机模板和（F）清洁没有有机模板的中空二氧化硅。
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公开(公告)号：US20130277201A1
公开(公告)日：2013-10-24
申请号：US13653794
申请日：2012-10-17
发明人： Hee Dong Jang , Han Kwon Chang , Dae Sup Kil
IPC分类号： C01B33/037
CPC分类号： C01B33/037 , C01B33/02
摘要： Disclosed is a method for selectively separating and recovering silicon from waste silicon sludge generated during a semiconductor manufacturing process. With the method for separating and recovering silicon from the silicon sludge, oil components, iron, silicon carbide that are included in the silicon sludge may be removed and silicon may be selectively separated and recovered. In addition, silicon may be efficiently recovered without injection of an additive for precipitating a specific component or without a separate device such as a magnetic separator, or the like, for removing iron.
摘要翻译： 公开了一种用于在半导体制造过程中产生的废硅污泥中选择性分离和回收硅的方法。 利用从硅污泥中分离回收硅的方法，可以除去包含在硅污泥中的油组分，铁，碳化硅，并且可以选择性地分离和回收硅。 此外，可以有效地回收硅，而不注入用于沉淀特定成分的添加剂，或者不用用于除铁的分离装置如磁选机等。
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公开(公告)号：US09296617B2
公开(公告)日：2016-03-29
申请号：US13653794
申请日：2012-10-17
发明人： Hee Dong Jang , Han Kwon Chang , Dae Sup Kil
IPC分类号： C01B33/02 , C01B33/037
CPC分类号： C01B33/037 , C01B33/02
摘要： Disclosed is a method for selectively separating and recovering silicon from waste silicon sludge generated during a semiconductor manufacturing process. With the method for separating and recovering silicon from the silicon sludge, oil components, iron, silicon carbide that are included in the silicon sludge may be removed and silicon may be selectively separated and recovered. In addition, silicon may be efficiently recovered without injection of an additive for precipitating a specific component or without a separate device such as a magnetic separator, or the like, for removing iron.
摘要翻译： 公开了一种用于在半导体制造过程中产生的废硅污泥中选择性分离和回收硅的方法。 利用从硅污泥中分离回收硅的方法，可以除去包含在硅污泥中的油组分，铁，碳化硅，并且可以选择性地分离和回收硅。 此外，可以有效地回收硅，而不注入用于沉淀特定成分的添加剂，或者不用用于除铁的分离装置如磁选机等。
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公开(公告)号：US08883254B2
公开(公告)日：2014-11-11
申请号：US14077982
申请日：2013-11-12
发明人： Jiwoong Kim , Hee Dong Jang , Han Kwon Chang
CPC分类号： C01B33/128 , C01B33/193 , C01P2004/34 , C01P2004/61 , Y10T428/2982 , Y10T428/2984 , Y10T428/2989 , Y10T428/2991
摘要： Disclosed is a method of synthesizing hollow silica having the size of micrometers from sodium silicate. The method includes fabricating a polystyrene organic template from polystyrene latex, (B) cleaning the polystyrene organic template, (C) exchanging media by using a water-base medium, introducing the cleaned polystyrene organic template and sodium silicate, and preparing a silica-coated organic template by performing an acidic hydrolysis reaction, and (D) cleaning the silica-coated organic template included in the water-base medium by using water. The size of the organic template is adjusted by controlling an amount of introduced AIBN included when the organic template is fabricated. The cleaning of the organic template is preferably performed by using water (H2O). The method further includes (B) removing the organic template by using THF and (F) cleaning the hollow silica having no organic template.
摘要翻译： 公开了一种从硅酸钠合成尺寸为微米的中空二氧化硅的方法。 该方法包括由聚苯乙烯胶乳制造聚苯乙烯有机模板，（B）清洗聚苯乙烯有机模板，（C）通过使用水基介质，引入清洁的聚苯乙烯有机模板和硅酸钠来交换介质，以及制备二氧化硅涂覆 通过进行酸性水解反应的有机模板，和（D）使用水清洗包含在水基介质中的二氧化硅涂覆的有机模板。 通过控制当制造有机模板时包括的引入的AIBN的量来调节有机模板的尺寸。 有机模板的清洁优选通过使用水（H 2 O）进行。 该方法还包括（B）通过使用THF除去有机模板和（F）清洁没有有机模板的中空二氧化硅。
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