公开(公告)号：US09684100B2

公开(公告)日：2017-06-20

申请号：US14825881

申请日：2015-08-13

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Won Kook Choi ,  Dong Hee Park ,  Chang Hwan Wie ,  Do Kyung Hwang

IPC: G02B1/115 ,  G02B1/118

CPC classification number: G02B1/115 ,  G02B1/118 ,  Y10T428/24413

Abstract: Provided are an anti-reflection nano-coating structure and a method of manufacturing the same. The anti-reflection nano-coating structure has low dependency on incident light. The anti-reflection nano-coating structure has a normal-align nano-structure on the entire surface of the substrate regardless of curvature of the substrate by controlling a ratio of reactive gas during sputtering.