公开(公告)号：US20190187368A1

公开(公告)日：2019-06-20

申请号：US16216250

申请日：2018-12-11

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Seok Joon KWON ,  Hyoung Uk KIM ,  IL KI HAN ,  KWAN IL LEE ,  Seonju YEO

IPC: G02B6/10 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

CPC classification number: G02B6/102 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/32 ,  G03F7/322 ,  G03F7/40

Abstract: In a method for fabricating a broadband near infrared plasmonic waveguide, the method includes forming a first pattern on a substrate. A metal thin film is evaporated on the substrate on which the first pattern is formed. The first pattern is removed from the substrate on which the metal thin film is evaporated, to remain a second pattern on the substrate on which the metal thin film is evaporated. The substrate on which the second pattern is formed is heated, to induce dewetting, so that metal nano particles are formed on the substrate.