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1.发明申请METHOD OF MANUFACTURING MULTICOLOR QUANTUM DOT PATTERN, MULTICOLOR QUANTUM DOT PATTERN FORMED BY THE METHOD, AND QUANTUM DOT LIGHT-EMITTING DEVICE FOR THE METHOD 有权制造多模量子模式的方法，由该方法形成的多光子量子点图案和用于该方法的量子点光发射装置公开(公告)号：US20160351842A1
公开(公告)日：2016-12-01
申请号：US14754941
申请日：2015-06-30
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Joon-Suh PARK , Il Ki HAN , Ji Hoon KYHM
CPC classification number: H01L51/502 , H01L51/0014
Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, which includes: forming a first photoresist pattern on a substrate; activating a surface of the substrate having the first photoresist pattern formed thereon; forming a first quantum dot layer on the activated substrate; generating a first quantum dot pattern by removing the first photoresist pattern; and generating a second quantum dot pattern on the same layer as the first quantum dot pattern generated on the substrate. Accordingly, various kinds of quantum dots may be easily implemented at a single substrate.
Abstract translation: 公开了一种制造多色量子点图案的方法，其包括：在基底上形成第一光致抗蚀剂图案; 激活其上形成有第一光致抗蚀剂图案的基板的表面; 在激活的基板上形成第一量子点层; 通过去除第一光致抗蚀剂图案产生第一量子点图案; 以及在与所述基板上产生的所述第一量子点图案相同的层上产生第二量子点图案。 因此，可以容易地在单个基板上实现各种量子点。
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公开(公告)号：US20170229650A1
公开(公告)日：2017-08-10
申请号：US15495883
申请日：2017-04-24
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Joon-Suh PARK , Il Ki HAN , Ji Hoon KYHM
CPC classification number: H01L51/0016 , H01L51/0003 , H01L51/0014 , H01L51/0096 , H01L51/502 , H01L51/5036 , H01L51/56
Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, the forming of a first quantum dot layer on the activated substrate includes: coating a polymer with a polarity opposite to a surface charge of the activated substrate or coating quantum dots having a functional group charged with a polarity opposite to a surface charge of the activated substrate onto the substrate; washing the substrate with water having pH 6 to pH 8; drying the substrate with flow of nitrogen, argon or air; coating quantum dots having a functional group charged with a polarity opposite to the polymer or the quantum dots charge coated on the substrate, or coating a polymer with a polarity opposite to the quantum dots charge coated on the substrate; washing the substrate with water having pH 6 to pH 8; and drying the substrate with flow of nitrogen, argon or air.
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