公开(公告)号：US20170229650A1

公开(公告)日：2017-08-10

申请号：US15495883

申请日：2017-04-24

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Joon-Suh PARK ,  Il Ki HAN ,  Ji Hoon KYHM

IPC: H01L51/00 ,  H01L51/56 ,  H01L51/50

CPC classification number: H01L51/0016 ,  H01L51/0003 ,  H01L51/0014 ,  H01L51/0096 ,  H01L51/502 ,  H01L51/5036 ,  H01L51/56

Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, the forming of a first quantum dot layer on the activated substrate includes: coating a polymer with a polarity opposite to a surface charge of the activated substrate or coating quantum dots having a functional group charged with a polarity opposite to a surface charge of the activated substrate onto the substrate; washing the substrate with water having pH 6 to pH 8; drying the substrate with flow of nitrogen, argon or air; coating quantum dots having a functional group charged with a polarity opposite to the polymer or the quantum dots charge coated on the substrate, or coating a polymer with a polarity opposite to the quantum dots charge coated on the substrate; washing the substrate with water having pH 6 to pH 8; and drying the substrate with flow of nitrogen, argon or air.

公开(公告)号：US20160351842A1

公开(公告)日：2016-12-01

申请号：US14754941

申请日：2015-06-30

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Joon-Suh PARK ,  Il Ki HAN ,  Ji Hoon KYHM

IPC: H01L51/50 ,  H01L51/00

CPC classification number: H01L51/502 ,  H01L51/0014

Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, which includes: forming a first photoresist pattern on a substrate; activating a surface of the substrate having the first photoresist pattern formed thereon; forming a first quantum dot layer on the activated substrate; generating a first quantum dot pattern by removing the first photoresist pattern; and generating a second quantum dot pattern on the same layer as the first quantum dot pattern generated on the substrate. Accordingly, various kinds of quantum dots may be easily implemented at a single substrate.

Abstract translation: 公开了一种制造多色量子点图案的方法，其包括：在基底上形成第一光致抗蚀剂图案; 激活其上形成有第一光致抗蚀剂图案的基板的表面; 在激活的基板上形成第一量子点层; 通过去除第一光致抗蚀剂图案产生第一量子点图案; 以及在与所述基板上产生的所述第一量子点图案相同的层上产生第二量子点图案。 因此，可以容易地在单个基板上实现各种量子点。

公开(公告)号：US20150364632A1

公开(公告)日：2015-12-17

申请号：US14607621

申请日：2015-01-28

Applicant: Korea Institute of Science and Technology

Inventor： So Hye CHO ,  Il Ki HAN ,  Doo Hyun KO ,  Joon Soo HAN ,  Bok Ryul YOO ,  Seung Yong LEE ,  Hyungduk KO ,  Joon-Suh PARK

IPC: H01L31/055 ,  H01L31/0216 ,  H01L31/0224 ,  H01L31/032 ,  H01L31/0304

CPC classification number: H01L31/055 ,  C09K11/06 ,  C09K11/7773 ,  C09K11/7774 ,  C09K11/7787 ,  C09K2211/1007 ,  C09K2211/1044 ,  C09K2211/1088 ,  H01L31/02168 ,  H01L31/0749 ,  H01L31/077 ,  Y02E10/52 ,  Y02E10/541

Abstract: The present invention relates to a solar cell having a wavelength converting layer formed of a polysilazane and a manufacturing method thereof to allow for low temperature sintering, to protect a wavelength converter from oxidation, degradation, and whitening, and thereby improve efficiency of the solar cell. The present invention provides for the solar cell including the wavelength converting layer which is formed by applying a coating solution containing a solvent, a polysilazane, and a wavelength converter onto a cell and an outer surface or inside of the cell, and then curing, and a manufacturing method of.

Abstract translation: 本发明涉及一种具有由聚硅氮烷形成的波长转换层的太阳能电池及其制造方法，以进行低温烧结，以保护波长转换器免受氧化，降解和增白，从而提高太阳能电池的效率 。 本发明提供一种太阳能电池，其包括通过将含有溶剂，聚硅氮烷和波长转换器的涂布溶液涂布到电池的电池和外表面或内部而形成的波长转换层，然后固化，以及 一种制造方法。