公开(公告)号：US11512397B2

公开(公告)日：2022-11-29

申请号：US17132560

申请日：2020-12-23

申请人： Kanto Kagaku Kabushiki Kaisha

发明人： Ryou Kouno ,  Takuo Ohwada

IPC分类号： C23F1/26 ,  H01L21/3213 ,  H01L21/308 ,  H01L21/768

摘要： An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided. The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.

公开(公告)号：US20190301026A1

公开(公告)日：2019-10-03

申请号：US16316054

申请日：2017-07-07

申请人： Kanto Kagaku Kabushiki Kaisha

发明人： Ryou Kouno ,  Takuo Ohwada

IPC分类号： C23F1/26 ,  H01L21/3213

摘要： An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided.The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.