摘要:
The present invention relates to a photo-curable polymer composition comprising (a) a first block copolymer comprising at least two blocks A of polymerised monovinyl aromatic monomer, at least one internal block B of polymerised conjugated diene monomer, and at least one tapered or random block C of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer and/or at least one block D which may be a block of polymerised conjugated diene monomer or a tapered or random block of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer, wherein block C is an internal polymer block adjacent a terminal block A or an internal block A which is adjacent to a terminal block D, and block D is a terminal block adjacent an internal block A, and, optionally, a residue of a coupling agent, wherein the residue, if present, is derived from a coupling agent containing alkoxy or epoxy functional groups; and (b) a photo-initiator. The present invention further relates to a flexographic printing plate precursor comprising a photo-curable layer sandwiched between two release films or a release film and a support. In addition, the present invention relates to a cured polymer composition, obtainable by curing the photo-curable composition; to a flexographic printing plate containing the cured polymer composition, and to a process for printing on a substrate with the flexographic printing plate.
摘要:
Radiation sensitive block copolymers to be used in hot melt adhesive composition characterized in that they have the general formula (AB).sub.p (B.sup.1).sub.q X, wherein A is poly(vinylaromatic) block and B and B.sup.1 are poly(butadiene) blocks, wherein X is the residue of a hexavalent coupling agent, wherein p and q both have a number average value in the range from 1.5 to 4.5, whereas the sum of p and q values being 6, wherein the block copolymers have an average bound vinyl aromatic content in the range of from 10 to 50 wt %, preferably in the range of from 10 to 30 wt %, a total apparent molecular weight in the range of from 100,000 to 500,000, and a vinyl content in the poly(butadiene) blocks in the range of from 35 to 70 wt %.
摘要:
Block copolymers suitable for hot melt adhesive composition characterized in that they have the general formula (AB).sub.p (B.sup.1).sub.q X, wherein A is poly(vinylaromatic) block and B and B.sup.1 are the same or different poly(butadiene) blocks, wherein the 1,2 addition (vinyl) content is in the range of from 25 to 70% by weight, wherein X is the residue of a multivalent coupling agent having a maximum of active sites (m) in the range of from 3 to 6, wherein p and q both are integers of from 0 to m, provided that the sum of p and q values is less than m and the coupling efficiency is less than 90%, said block copolymer having an average total vinyl aromatic content in the range of from 10 to 50 wt % and preferably in the range of from 10 to 30 wt %, and having a total apparent molecular weight in the range of from 100,000 to 500,000. Adhesive, sealant, or coating compositions comprising said block copolymers and in particular radiation curable compositions, the use of said compositions, and processes for the preparation of said block copolymers are also included herein.