EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE
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    发明申请
    EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE 审中-公开
    曝光装置,曝光方法和制造显示板基板的方法

    公开(公告)号:US20090033899A1

    公开(公告)日:2009-02-05

    申请号:US12175233

    申请日:2008-07-17

    IPC分类号: G03B27/42 G03B27/58

    摘要: The movable stages carry chucks 10a and 10b and move towards secondary stage bases 11a and 11b and a primary stage base 11, thereby positioning the substrate 1 on the primary stage base 11. Each first laser length-measuring system includes laser sources 31a and 31b, bar mirrors 34a and 34b mounted below X stages 14 of the movable stages, and laser interferometers 32a and 32b disposed at positions deviated from X guide rails 13 on the primary stage base 11, so as to detect positions of the movable stages in X direction. The laser interferometers 32a and 32b will not be influenced by the vibration of the secondary stage bases 11a and 11b. Meanwhile, the measuring distance from the laser interferometers 32a and 32b to the movable stages on the primary stage base 11 is reduced.

    摘要翻译: 可移动台承载卡盘10a和10b,并朝向次级基座11a和11b以及初级基座11移动,从而将基板1定位在初级基座11上。每个第一激光长度测量系统包括激光源31a和31b, 安装在可移动台的X级14的下方的反射镜34a和34b以及设置在与主级基座11上的X导轨13偏离的位置处的激光干涉仪32a和32b,以便检测X方向上的可动台的位置。 激光干涉仪32a和32b不受二级基座11a和11b的振动的影响。 同时,从激光干涉仪32a和32b到初级基座11上的可移动台的测量距离减小。