公开(公告)号：US20080087615A1

公开(公告)日：2008-04-17

申请号：US11664342

申请日：2005-11-25

申请人： Katsuto Taniguchi ,  Kazuhiro Kojima ,  Atsuko Noya

发明人： Katsuto Taniguchi ,  Kazuhiro Kojima ,  Atsuko Noya

IPC分类号： B01D17/12

CPC分类号： G03F7/162 ,  B05C11/10

摘要： This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner. The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus. The photoresist coating apparatus comprises a combination of the coating liquid supplying apparatus with a slit coating apparatus.

摘要翻译： 本发明提供一种光致抗蚀剂涂布液供给装置和光致抗蚀剂涂敷液供给方法，用于向光致抗蚀剂涂布装置供给具有低颗粒含量的光致抗蚀剂涂布液，以及使用这种光致抗蚀剂涂布液供给装置的光致抗蚀剂涂敷装置， 实现涂层，而不会以成本有效的方式引起显着的缺陷。 光致抗蚀剂涂布液供给装置包括光致抗蚀剂涂布液用缓冲容器，用于从缓冲容器中拉出一部分涂布液的循环过滤装置，过滤涂布液，然后将过滤后的涂布液返回缓冲容器， 以及用于将涂布液从缓冲容器或循环装置供给到涂布装置的管道。 光致抗蚀剂涂布液供给方法使用光刻胶涂布液供给装置。 光刻胶涂布装置包括涂布液供给装置与狭缝涂布装置的组合。

公开(公告)号：US07867559B2

公开(公告)日：2011-01-11

申请号：US11664342

申请日：2005-11-25

申请人： Katsuto Taniguchi ,  Kazuhiro Kojima ,  Atsuko Noya

发明人： Katsuto Taniguchi ,  Kazuhiro Kojima ,  Atsuko Noya

IPC分类号： B05D3/12 ,  B05C13/02 ,  B05C11/10

CPC分类号： G03F7/162 ,  B05C11/10

摘要： This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner.The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus. The photoresist coating apparatus comprises a combination of the coating liquid supplying apparatus with a slit coating apparatus.

摘要翻译： 本发明提供一种光致抗蚀剂涂布液供给装置和光致抗蚀剂涂敷液供给方法，用于向光致抗蚀剂涂布装置供给具有低颗粒含量的光致抗蚀剂涂布液，以及使用这种光致抗蚀剂涂布液供给装置的光致抗蚀剂涂敷装置， 实现涂层，而不会以成本有效的方式引起显着的缺陷。 光致抗蚀剂涂布液供给装置包括光致抗蚀剂涂布液用缓冲容器，用于从缓冲容器中拉出一部分涂布液的循环过滤装置，过滤涂布液，然后将过滤后的涂布液返回缓冲容器， 以及用于将涂布液从缓冲容器或循环装置供给到涂布装置的管道。 光致抗蚀剂涂布液供给方法使用光刻胶涂布液供给装置。 光刻胶涂布装置包括涂布液供给装置与狭缝涂布装置的组合。