公开(公告)号：US20030029565A1

公开(公告)日：2003-02-13

申请号：US10142998

申请日：2002-05-13

Applicant: Kawasaki Microelectronics, Inc.

Inventor： Katsunori Suzuki ,  Hidetada Horiuchi ,  Yasushi Kikuchi ,  Jin Yokogawa ,  Ryouichi Kubo ,  Koji Wakabayashi

IPC: C23F001/00 ,  H01L021/306 ,  C23C016/00 ,  B05C011/11

CPC classification number: H01L21/67069 ,  C23C16/4404 ,  H01J37/32623

Abstract: Apparatus and methods for producing semiconductor devices are disclosed. A processing chamber includes an interior component having a stepped region including a plurality of raised sections and recessed sections divided by steps. With this apparatus, it is possible to prevent a film of deposited material formed on the stepped region from peeling, thereby decreasing the number of particles in the chamber and increasing the operation rate.

公开(公告)号：US20030024642A1

公开(公告)日：2003-02-06

申请号：US10142997

申请日：2002-05-13

Applicant: Kawasaki Microelectronics, Inc.

Inventor： Katsunori Suzuki ,  Hidetaka Horiuchi ,  Yasushi Kikuchi ,  Jin Yokogawa ,  Ryouichi Kubo ,  Koji Wakabayashi

IPC: C23F001/00 ,  C23C016/00

CPC classification number: H01L21/67069 ,  C23C16/4404 ,  H01J37/32623

Abstract: Apparatus and methods for producing semiconductor devices are disclosed. A processing chamber includes an interior component having a stepped region including a plurality of raised sections and recessed sections divided by steps. With this apparatus, it is possible to prevent a film of deposited material formed on the stepped region from peeling, thereby decreasing the number of particles in the chamber and increasing the operation rate.