公开(公告)号：US07604010B2

公开(公告)日：2009-10-20

申请号：US11209741

申请日：2005-08-24

申请人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

发明人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

IPC分类号： H01L21/00

CPC分类号： C23C16/4405 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

摘要翻译： 用于半导体工艺的成膜装置包括清洁气体供应电路，浓度测量部分和信息处理器。 清洗气体供给回路构成为向反应室供给清洗气体，进行从反应室的内表面除去来自成膜气体的副产物膜的清洗。 集中测定部设置在排气系统中，以监测来自反应室的废气中所含有的预定成分的浓度。 信息处理器被配置为将由浓度测量部获得的测量值与预设值进行比较，从而确定清洁的终点。

公开(公告)号：US20060042544A1

公开(公告)日：2006-03-02

申请号：US11209741

申请日：2005-08-24

申请人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

发明人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

IPC分类号： B08B3/12 ,  C23C16/00

CPC分类号： C23C16/4405 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

公开(公告)号：US07376490B2

公开(公告)日：2008-05-20

申请号：US11347568

申请日：2006-02-06

申请人： Katsunori Ueno ,  Tomoya Takahashi ,  Makoto Umeki

发明人： Katsunori Ueno ,  Tomoya Takahashi ,  Makoto Umeki

IPC分类号： G06F19/00

CPC分类号： H02J4/00 ,  Y04S20/224

摘要： A operational control device for supplying electric power from an electric power equipment to a plurality of power consumption systems store a power consumption pattern for each of the power consumption systems. It obtains a combined expected power consumption pattern by adding power consumption patterns of the operating power consumption systems. Next, a combined assumed power consumption pattern is obtained by adding a power consumption pattern, obtained based on a temporary operational start time, of a power consumption system which has made a request for a starting operation.

摘要翻译： 用于从电力设备向多个功率消耗系统提供电力的操作控制装置存储每个功率消耗系统的功耗模式。 它通过增加运行功耗系统的功耗模式来获得组合的预期功耗模式。 接下来，通过将已经作出起动操作的请求的功耗系统加上基于临时运行开始时间获得的功耗模式来获得组合的假想功耗模式。

公开(公告)号：US20060253225A1

公开(公告)日：2006-11-09

申请号：US11347568

申请日：2006-02-06

申请人： Katsunori Ueno ,  Tomoya Takahashi ,  Makoto Umeki

发明人： Katsunori Ueno ,  Tomoya Takahashi ,  Makoto Umeki

IPC分类号： G05D3/12

CPC分类号： H02J4/00 ,  Y04S20/224

摘要： In an operational control device 20 of a power supply system for supplying electric power from an electric power equipment 4 to a plurality of power consumption systems 8A to 8F, a power consumption pattern of each of the power consumption systems is stored, and a combined expected power consumption pattern 40 is obtained by adding together power consumption patterns of operating power consumption systems. Next, a combined assumed power consumption pattern is obtained by adding a power consumption pattern, obtained based on a temporary operational start time, of a power consumption system which has made the request for starting operation to the combined expected power consumption pattern. Subsequently, the combined assumed power consumption pattern and a preset allowable power 42 of the power supply equipment are compared to each other, and the temporary operational start time of the power consumption pattern is delayed along the axis of time until each of the power values in the combined assumed power consumption pattern is no longer above the preset allowable power. Thereafter, an expected operational start time is decided based on the temporary operational start time at which all power values represented in the combined assumed power consumption pattern are smaller than the preset allowable power, and an operational permission signal is outputted when the current time reaches the decided expected operational start time.

摘要翻译： 在从电力设备4向多个电力消耗系统8A〜8F供电的供电系统的运转控制装置20中，存储有各功率消耗系统的功耗模式， 组合的预期功耗模式40通过将工作功耗系统的功耗模式相加而获得。 接下来，通过将已经进行了开始运行请求的功耗系统的基于临时运行开始时间获得的功耗模式与组合的预期功耗模式相加来获得组合的假想功耗模式。 随后，将组合的假设功耗模式和电源设备的预设容许功率42相互比较，并且功耗模式的临时操作开始时间沿时间轴延迟，直到每个功率值在 组合的假设功耗模式不再高于预设容许功率。 此后，基于组合的假想功耗模式中表示的所有功率值小于预设容许功率的临时操作开始时间来决定预期操作开始时间，并且当当前时间到达时输出操作许可信号 决定预计运营开始时间。