公开(公告)号：US4568835A

公开(公告)日：1986-02-04

申请号：US438468

申请日：1982-11-02

申请人： Kazunori Imamura ,  Akikazu Tanimoto ,  Nobutoshi Abe

发明人： Kazunori Imamura ,  Akikazu Tanimoto ,  Nobutoshi Abe

IPC分类号： G03B27/32 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

CPC分类号： G01N21/94 ,  G01N21/956 ,  G01N2201/0642 ,  G01N2201/104

摘要： An apparatus for detecting foreign matter present on a planar substrate comprises apparatus for scanning the surface of the substrate with an oblique incident light beam, apparatus for photo-electrically detecting the scattered light generator in the trajectory of the light beam scanning on the substrate, and apparatus for eliminating stray light unnecessary for the foreign matter detection.

摘要翻译： 用于检测存在于平面基板上的异物的装置包括：用斜入射光束扫描基板的表面的装置，用于在基板上的光束扫描的轨迹中对散射光发生器进行光电检测的装置;以及 用于消除异物检测所不需要的杂散光的装置。

公开(公告)号：US4715392A

公开(公告)日：1987-12-29

申请号：US11413

申请日：1987-02-04

申请人： Nobutoshi Abe ,  Kazunori Imamura

发明人： Nobutoshi Abe ,  Kazunori Imamura

IPC分类号： G03F1/82 ,  B08B3/02

CPC分类号： G03F1/82 ,  Y10S134/902

摘要： Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again. In the washing and cleaning system, the washing and cleaning unit has a wash tub, means disposed in the wash tub for spraying or jetting a cleaning liquid against the surface of a substrate, means for rubbing the surfaces of the substrate which are wetted by the cleaning liquid, thereby removing foreign particles and washing means for washing away the cleaning liquid still remaining over the surfaces of the substrate even after removal of foreign particles.

摘要翻译： 自动光掩模或掩模版清洗和清洁系统包括用于检查外来颗粒是否附着到基板表面的异物检测单元; 洗涤和清洁单元，用于利用清洗液清洗和清洁基板的表面，从而去除异物和从壳体中取出基板的转移装置，将取出的基板转移到洗涤和清洁单元，然后将洗涤和清洁的 底物到异物检查单元，最后将检查的基板再次插入外壳。 在洗涤和清洁系统中，洗涤和清洁单元具有洗涤桶，设置在洗涤桶中用于喷射或喷射清洁液体抵靠基材表面的装置，用于摩擦基材表面的装置， 清除液体，从而除去外来颗粒和洗涤装置，以便即使在除去外来颗粒之后也清洗仍残留在基材表面上的清洗液体。

公开(公告)号：US4422547A

公开(公告)日：1983-12-27

申请号：US445030

申请日：1982-11-29

申请人： Nobutoshi Abe ,  Yukio Kakizaki ,  Jiro Kobayashi

发明人： Nobutoshi Abe ,  Yukio Kakizaki ,  Jiro Kobayashi

IPC分类号： G03F7/20 ,  H01L21/02 ,  H01L21/673 ,  B65D85/30 ,  B65D81/02

CPC分类号： H01L21/67353 ,  G03F1/66 ,  G03F7/70741 ,  H01L21/02 ,  H01L21/67359 ,  H01L21/67369 ,  H01L21/67386

摘要： A container for a piece of substrate such as reticle, mask or wafer is disclosed. The container comprises a housing body having an opening for receiving a substrate, a door for closing and opening said opening of the housing body and means for fixing the received substrate to the container. Said fixing means includes a contact member movable to fix the substrate in the position and a member for moving the contact member in link with the motion of the door.

摘要翻译： 公开了一种用于诸如掩模版，掩模或晶片的基片的容器。 容器包括具有用于容纳基底的开口的壳体，用于关闭和打开壳体主体的开口的门，以及用于将接收的基底固定到容器的装置。 所述固定装置包括可移动以将基板固定在该位置的接触构件和用于使接触构件与门的运动相联动的构件。