摘要:
An image processing apparatus includes an operating portion to output operation identification information in response to acceptance of an operation designated by an operation user, an application portion operative, in response to reception of one of process identification information items, to perform a process of the type corresponding to the received process identification information item, an association portion operative, at the stage when an application program is installed, to associate a plurality of types of processes determined by the application program respectively with sets of one or more operations among a plurality of types of operations, a process specifying portion to specify a process associated with the set of one or more operations specified by the operation identification information item(s) output from the operating portion, and an operation notification portion to output the process identification information of the specified process to the application portion.
摘要:
An information processing system comprises a user terminal and an information processing device. A remote operation screen image for remotely operating the information processing device is displayed with the user terminal so that the information processing device is operated by remote control via the user terminal. The information processing device includes: a screen image controlling part for receiving operation information from the user terminal; a contents determining part for determining if contents accessed by a browser are internal contents of the information processing device when the operation information is a process request requiring start up of the browser; and a browser controlling part for starting up a first browser on the information processing device when the internal contents are to be accessed, and sending a browser start up instruction to cause start up of a second browser installed on the user terminal when external contents are to be accessed.
摘要:
The present invention relates to a removal cleaning method for a semiconductor substrate or a semiconductor device with metal wirings by using a remover composition, wherein the remover composition contains a dissolution agent having an alumina dissolution amount as measured according to the standard test (A-1) of 10 ppm or more, and an inhibitor having an aluminum etching amount as measured according to the standard test (B-1) of 7 nm or less, and the remover composition substantially does not contain a fluorine-containing compound; a method of producing a semiconductor substrate or a semiconductor device, including the step involving the removal cleaning method; and a remover composition containing a specified acid, and a specified inorganic acid salt and/or organic acid salt. The removal cleaning method and the remover composition of the present invention can be suitably used for producing even higher-speed, even more highly integrated and high quality electronic parts such as LCDs, memories and CPUs, particularly for cleaning a semiconductor substrate or a semiconductor device in which a wiring material containing aluminum and/or titanium is used.