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公开(公告)号：US09127352B2
公开(公告)日：2015-09-08
申请号：US13120863
申请日：2009-09-18
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3435 , Y10T156/10
摘要： Provided is a cylindrical sputtering target which attains a high production yield in a film-forming process even when a film is formed by sputtering with a long cylindrical sputtering target constituted by a plurality of cylindrical target materials.A multi-divided cylindrical sputtering target formed by bonding a cylindrical base and a plurality of cylindrical target materials together with a bonding material has a divided portion where adjacent cylindrical target materials are arranged with a gap therebetween, while outer peripheral faces of the adjacent cylindrical target materials have a step of 0.5 mm or less therebetween in the divided portion. Such a target is obtained by fixing the cylindrical target materials with reference to the outer peripheral faces of the cylindrical target materials when arranging the cylindrical target materials with reference to the cylindrical base.
摘要翻译： 提供了一种圆柱形溅射靶，即使在用由多个圆柱形目标材料构成的长圆柱形溅射靶通过溅射形成膜时，在成膜过程中也能获得高生产率。 通过将圆柱形基底和多个圆柱形目标材料与接合材料一起接合而形成的多分割圆柱形溅射靶具有分开的部分，其中相邻的圆柱形靶材料间隔开间隔，而相邻圆柱形靶材的外周面 在分割部分中，材料的间隔为0.5mm以下。 这样的目标是通过相对于圆筒状的基体配置圆筒状靶材时，相对于圆筒状靶材的外周面固定圆筒状的靶材。
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公开(公告)号：US20110240467A1
公开(公告)日：2011-10-06
申请号：US13120863
申请日：2009-09-18
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3435 , Y10T156/10
摘要： Provided is a cylindrical sputtering target which attains a high production yield in a film-forming process even when a film is formed by sputtering with a long cylindrical sputtering target constituted by a plurality of cylindrical target materials.A multi-divided cylindrical sputtering target formed by bonding a cylindrical base and a plurality of cylindrical target materials together with a bonding material has a divided portion where adjacent cylindrical target materials are arranged with a gap therebetween, while outer peripheral faces of the adjacent cylindrical target materials have a step of 0.5 mm or less therebetween in the divided portion. Such a target is obtained by fixing the cylindrical target materials with reference to the outer peripheral faces of the cylindrical target materials when arranging the cylindrical target materials with reference to the cylindrical base.
摘要翻译： 提供了一种圆柱形溅射靶，即使在用由多个圆柱形目标材料构成的长圆柱形溅射靶通过溅射形成膜时，在成膜过程中也能获得高生产率。 通过将圆柱形基底和多个圆柱形目标材料与接合材料一起接合而形成的多分割圆柱形溅射靶具有分开的部分，其中相邻的圆柱形靶材料间隔开间隔，而相邻圆柱形靶材的外周面 在分割部分中，材料的间隔为0.5mm以下。 这样的目标是通过相对于圆筒状的基体配置圆筒状靶材时，相对于圆筒状靶材的外周面固定圆筒状的靶材。
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公开(公告)号：US20110100808A1
公开(公告)日：2011-05-05
申请号：US12997043
申请日：2009-06-09
CPC分类号： H01J37/3491 , C23C14/081 , C23C14/086 , C23C14/3407 , C23C14/3414 , H01J37/3426
摘要： Provided is a cylindrical ceramic sputtering target, which significantly reduces the occurrence of a crack, a chip, extraordinary discharge and a nodule.By filling a molten bonding material in a cavity defined by a cylindrical ceramic target material and a cylindrical base material, starting cooling the molten bonding material from its one end toward its other end in a cylindrical axial direction in sequence, and further filling the molten bonding material in the cavity during cooling, a cylindrical ceramic sputtering target is manufactured so as to be characterized in that as observed by an X-ray radiograph of the bonding material, the total area of portions where no bonding material exists is 10 cm2 or less per 50 cm2 of X-ray radiograph area, and the maximum area of the portions where no bonding material exists is 9 cm2 or less.
摘要翻译： 提供了一种圆柱形陶瓷溅射靶，其显着减少了裂纹，芯片，异常放电和结节的发生。 通过将熔融接合材料填充在由圆柱形陶瓷靶材料和圆柱形基材限定的空腔中，依次从圆柱形轴向从其一端朝向另一端开始冷却熔融粘合材料，并进一步填充熔融粘合 在冷却期间的空腔中的材料，制造圆柱形陶瓷溅射靶，其特征在于，通过接合材料的X射线照片观察，不存在接合材料的部分的总面积为10cm 2以下 50cm 2的X射线摄影区域，不存在接合材料的部分的最大面积为9cm 2以下。
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