公开(公告)号：US07534469B2

公开(公告)日：2009-05-19

申请号：US11095314

申请日：2005-03-31

申请人： Kiyoshi Satoh ,  Yoshinobu Kano

发明人： Kiyoshi Satoh ,  Yoshinobu Kano

IPC分类号： C23C16/00

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  C23C16/52

摘要： A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having monochromaticity through an optical window provided on an inner wall of the reactor and receiving its reflected light is provided.

摘要翻译： 一种CVD装置，包括光学单元，其通过设置在反应器的内壁上的光学窗口照射具有单色光的反射器的内表面来检测附着在CVD反应器的内表面上的污染物的质量，并接收其反射光 被提供。

公开(公告)号：US20060228473A1

公开(公告)日：2006-10-12

申请号：US11095314

申请日：2005-03-31

申请人： Kiyoshi Satoh ,  Yoshinobu Kano

发明人： Kiyoshi Satoh ,  Yoshinobu Kano

IPC分类号： C23C16/00 ,  B08B6/00 ,  H01L21/00 ,  B05C11/00

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  C23C16/52

摘要： A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having monochromaticity through an optical window provided on an inner wall of the reactor and receiving its reflected light is provided.

公开(公告)号：US06297478B1

公开(公告)日：2001-10-02

申请号：US09139776

申请日：1998-08-25

申请人： Yoshinobu Kano ,  Tetsuya Tsumura ,  Kazuhiro Murakami ,  Osamu Miyazaki ,  Kiyoshi Hino

发明人： Yoshinobu Kano ,  Tetsuya Tsumura ,  Kazuhiro Murakami ,  Osamu Miyazaki ,  Kiyoshi Hino

IPC分类号： B65B4702

CPC分类号： B29C51/425 ,  B29B13/023 ,  B29C51/082

摘要： A heating unit includes a pair of heating bodies for heating a band film conveyed along a predetermined film feeding path defined by a film guide. An embossing unit includes a punch and a die for forming a predetermined raised pattern on a heated surface of the band film. A shifting mechanism locates the heating unit and the embossing unit closely by a first distance during a thermal processing of the band film and separates at least one of the heating unit and the band film far away from the other by a second distance larger than the first distance when the thermal processing is interrupted or stopped.

摘要翻译： 加热单元包括一对用于加热沿着由胶片导向器限定的预定胶片馈送路径传送的带膜的加热体。 压花单元包括冲头和用于在带膜的加热表面上形成预定凸起图案的模具。 换档机构在带膜的热处理期间使加热单元和压花单元紧密地定位第一距离，并且将加热单元和带膜中的至少一个远离另一个将距离大于第一距离 热处理中断或停止时的距离。