公开(公告)号：US6019876A

公开(公告)日：2000-02-01

申请号：US80088

申请日：1998-05-15

申请人： Klaus Goedicke ,  Michael Junghahnel ,  Torsten Winkler ,  Artur Lang ,  Dieter Meyer ,  Manfred Muller ,  Hans-Herrmann Schneider ,  Rainer C. Schneider

发明人： Klaus Goedicke ,  Michael Junghahnel ,  Torsten Winkler ,  Artur Lang ,  Dieter Meyer ,  Manfred Muller ,  Hans-Herrmann Schneider ,  Rainer C. Schneider

IPC分类号： C23C14/32 ,  G11B5/84 ,  G11B5/85 ,  G11B5/851

CPC分类号： G11B5/851 ,  G11B5/8404

摘要： A method and apparatus for depositing an underlayer and/or a magnetic thin film layer on a data storage disk are described. The sputtering power is supplied in the form of pulses during the application of the underlayer and/or magnetic storage to periodically ignite the plasma and increase the charge-carrier density in the sputtering chamber. The repetition frequency and parameters for the pulses and pauses between pulses are adjusted to achieve a desired nominal value for the coercive field strength of the magnetic layer. Preferably the repetition frequency of the power switching is from 10 to 80 kHz and the ratio of pulse length to pulse pause is within 5:1 to 1:5.

摘要翻译： 描述了用于在数据存储盘上沉积底层和/或磁性薄膜层的方法和装置。 在施加底层和/或磁性存储器期间以脉冲的形式提供溅射功率以周期性地点燃等离子体并且增加溅射室中的电荷 - 载流子密度。 脉冲之间的脉冲和重复频率的重复频率和参数被调整以达到磁层的矫顽磁场强度的期望标称值。 优选地，功率切换的重复频率为10至80kHz，并且脉冲长度与脉冲暂停的比率在5:1至1:5之间。