LAPPING APPARATUS AND LAPPING METHOD
    2.
    发明申请
    LAPPING APPARATUS AND LAPPING METHOD 审中-公开
    拉丝装置和拉丝方法

    公开(公告)号:US20090061737A1

    公开(公告)日:2009-03-05

    申请号:US12141416

    申请日:2008-06-18

    IPC分类号: B24B1/00 B24B7/00

    CPC分类号: B24B37/005 B24B37/042

    摘要: A lap platen has a lapping surface contacting a surface of a work piece. A lap base has a support surface brought into contact with and supported by the lapping surface. An adapter has a first support part, a second support part and an arm part. The first support part is supported by the lap base. The work piece is attached to the second support part so that a surface of the work piece to be processed contacts the lapping surface. The arm part extends between the first and second support parts. A height adjusting mechanism adjusts a height from the lapping surface to the first support part. An inclination detector is provided to the adapter to detect an inclination of the adapter. The inclination of the adapter relative to the lapping surface is adjusted by adjusting the height of the first support part by the height adjusting mechanism.

    摘要翻译: 膝盖台具有接触工件表面的研磨表面。 搭接基座具有与研磨表面接触并由研磨表面支撑的支撑表面。 适配器具有第一支撑部分,第二支撑部分和臂部分。 第一支撑部分由膝盖支撑。 工件附接到第二支撑部分,使得待加工的工件的表面接触研磨表面。 臂部分在第一和第二支撑部分之间延伸。 高度调节机构调节从研磨表面到第一支撑部分的高度。 向适配器提供倾斜检测器以检测适配器的倾斜度。 适配器相对于研磨表面的倾斜度通过调节第一支撑部分的高度由高度调节机构来调节。

    LAPPING APPARATUS AND LAPPING METHOD
    3.
    发明申请
    LAPPING APPARATUS AND LAPPING METHOD 审中-公开
    拉丝装置和拉丝方法

    公开(公告)号:US20080182484A1

    公开(公告)日:2008-07-31

    申请号:US12020704

    申请日:2008-01-28

    IPC分类号: B24B1/00 B24B7/00

    CPC分类号: B24B37/30 B24B37/048

    摘要: A lapping apparatus includes a lapping plate having a lapping surface thereon that moves relative to a work. The lapping apparatus can adjust an inclination of the work in a latitudinal direction, thereby obtained preferable parallelization of both a reading elements and writing element to the lapping surface. As a result, the lapping apparatus can provide magnetic heads suitable for the perpendicular recording.

    摘要翻译: 研磨装置包括在其上具有相对于工件移动的研磨表面的研磨板。 研磨装置可以在纬向方向上调整工件的倾斜度,从而获得读取元件和书写元件两者平均化到研磨表面的优点。 结果,研磨装置可以提供适于垂直记录的磁头。

    Lapping machine, row tool, and lapping method
    4.
    发明授权
    Lapping machine, row tool, and lapping method 失效
    研磨机,排工具和研磨方法

    公开(公告)号:US06315636B1

    公开(公告)日:2001-11-13

    申请号:US09483906

    申请日:2000-01-18

    IPC分类号: B24B4900

    摘要: Disclosed herein is a lapping machine for lapping a row bar having a plurality of head sliders. The lapping machine includes a lap plate for providing a lapping surface, a row tool having a work surface for pressing the row bar against the lapping surface, and a mechanism for operating the row tool so that a given pressure distribution is produced between the row bar and the lapping surface. The row tool has a plurality of holes arranged along the work surface. The mechanism includes a plurality of pivoted links each having a load point where a force having a direction perpendicular to the work surface is applied to the row tool in each of the holes. Each of the pivoted links further has a support point as the fulcrum and an effort point where a force having a direction substantially parallel to the work surface is received. The ratio of a distance between the load point and the support point to a distance between the effort point and the support point is substantially constant. With this configuration, the spacing between any adjacent ones of the holes of the row tool can be easily reduced to thereby improve a working accuracy.

    摘要翻译: 本文公开了一种用于研磨具有多个头滑块的行杆的研磨机。 研磨机包括用于提供研磨表面的搭接板,具有用于将排条压靠在研磨表面上的工作表面的行工具和用于操作行工具的机构,使得在行条之间产生给定的压力分布 和研磨表面。 行工具具有沿着工作表面布置的多个孔。 该机构包括多个枢转连杆,每个枢转连杆具有负载点,其中具有垂直于工作表面的方向的力被施加到每个孔中的行工具。 每个枢转连杆还具有作为支点的支撑点和具有基本上平行于工作表面的方向的力的努力点。 负载点和支撑点之间的距离与工作点与支撑点之间的距离的比率基本上是恒定的。 利用这种构造,可以容易地减少行工具的任何相邻孔之间的间隔,从而提高加工精度。

    Lapping machine, lapping method, and method of manufacturing magnetic head
    5.
    发明授权
    Lapping machine, lapping method, and method of manufacturing magnetic head 失效
    研磨机,研磨方法和制造磁头的方法

    公开(公告)号:US07014532B2

    公开(公告)日:2006-03-21

    申请号:US10823167

    申请日:2004-04-13

    IPC分类号: B24B49/00

    摘要: A lapping machine comprises a lapping surface plate (1) rotated by a rotating mechanism, a lapping jig (28) having a plurality of projections to bottom surfaces of which a work (30) to be lapped by a lapping surface on the lapping surface plate (1) is fitted, amount-of-projection adjusting elements (29) for adjusting the variation of the plurality of projections (28c) to the lapping surface plate (1) individually, and a control circuit (36) for outputting variation-of-projection control signals to the variation-of-projection adjusting elements (29).

    摘要翻译: 研磨机包括由旋转机构旋转的研磨表面板(1),具有多个突起到底面的研磨夹具(28),研磨表面板上的研磨表面上的研磨表面研磨的工件(30) (1)配置有用于分别调整多个突起(28c)与研磨面板(1)的变化量的投影量调整元件(29),以及控制电路(36) 投影控制信号输入到投影变化调整元件(29)。

    Method and apparatus for polishing, and lapping jig
    6.
    发明授权
    Method and apparatus for polishing, and lapping jig 失效
    抛光和研磨夹具的方法和设备

    公开(公告)号:US06913509B2

    公开(公告)日:2005-07-05

    申请号:US10460560

    申请日:2003-06-12

    摘要: Disclosed herein is a method of polishing a workpiece having a plurality of resistance elements by operating a plurality of bend mechanisms to push/pull the workpiece with respect to a polishing surface. This method includes the steps of measuring a shape of the workpiece, calculating an operational amount of each bend mechanism according to the shape measured, pressing the workpiece on the polishing surface with the bend mechanisms according to the operational amount calculated, and updating the operational amount according to a working amount of the workpiece. According to this method, magnetic heads included in the workpiece can be stably polished.

    摘要翻译: 本文公开了一种通过操作多个弯曲机构来相对于抛光表面推/拉工件来抛光具有多个电阻元件的工件的方法。 该方法包括以下步骤:测量工件的形状,根据测量的形状来计算每个弯曲机构的操作量,根据所计算的操作量按照弯曲机构在抛光表面上按压工件,并更新操作量 根据工件的工作量。 根据这种方法,可以稳定地抛光包含在工件中的磁头。