Single transistor with double gate structure for adjustable firing threshold voltage, and neuromorphic system using the same

    公开(公告)号:US12183821B2

    公开(公告)日:2024-12-31

    申请号:US17346372

    申请日:2021-06-14

    Abstract: Disclosed is a single transistor with a double gate structure for an adjustable firing threshold voltage and a neuromorphic system using the same. A single transistor neuron with a double gate structure according to an example embodiment includes a barrier material layer formed on a semiconductor substrate and comprising a hole barrier material or an electron barrier material; a floating body layer formed on the barrier material layer; a source and a drain formed at both sides of the floating body layer, respectively; a driving gate formed at a first side of the floating body layer without contacting the source and the drain; a control gate formed at a second side of the floating body layer without contacting the source and the drain; and a gate insulating film formed between the floating body layer and the driving gate and between the floating body layer and the control gate.

    Single Transistor with Double Gate Structure for Adjustable Firing Threshold Voltage, and Neuromorphic System Using the Same

    公开(公告)号:US20210391462A1

    公开(公告)日:2021-12-16

    申请号:US17346372

    申请日:2021-06-14

    Abstract: Disclosed is a single transistor with a double gate structure for an adjustable firing threshold voltage and a neuromorphic system using the same. A single transistor neuron with a double gate structure according to an example embodiment includes a barrier material layer formed on a semiconductor substrate and comprising a hole barrier material or an electron barrier material; a floating body layer formed on the barrier material layer; a source and a drain formed at both sides of the floating body layer, respectively; a driving gate formed at a first side of the floating body layer without contacting the source and the drain; a control gate formed at a second side of the floating body layer without contacting the source and the drain; and a gate insulating film formed between the floating body layer and the driving gate and between the floating body layer and the control gate.

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