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公开(公告)号：US20030048075A1
公开(公告)日：2003-03-13
申请号：US10112888
申请日：2002-04-01
Inventor： Keong-Su Lim , Duk-Young Jeon , Chang-Hyun Lee , Sang-Su Kim
IPC: H01J040/06
Abstract: A photocathode structure having a photoelectric face plate protective layer, in order to prevent a photoelectric effect from being deteriorated sharply due to a high reaction of oxygen with respect to most of existing photoelectric face plate materials when the photoelectric face plate used for generating photoelectrons by a photoelectric effect i s exposed to the atmosphere, is provided. For example, a diamond-like carbon thin layer is used as a photocathode protective layer, to thereby perform a function of protection of the photoelectric face plate through isolation of the photoelectric face plate from the atmosphere and enable electrons generated from the photoelectric face plate to pass through a diamond-like carbon thin layer, which is deposited thinly, by the tunneling effect so that the performance of the photocathode is not affected. By using the protective layer, the processes subsequent to the photoelectric face plate deposition process can be freely performed in the atmosphere, to thereby simplify the whole process. As a result, a production cost is lowered, and manufacturing of a device or apparatus using a large-are photocathode is facilitated.
Abstract translation: 一种具有光电面板保护层的光电阴极结构，为了防止光电效应由于氧气相对于大多数现有的光电面板材料而产生的高反应，当用于通过光电面板产生光电子的光电面板 提供光电效应暴露在大气中。 例如，使用类金刚石碳薄膜作为光电阴极保护层，由此通过将光电面板与大气隔离来实现保护光电面板的功能，并且能够使从光电面板产生的电子 通过通过隧道效应薄沉积的类金刚石碳薄层，使得光电阴极的性能不受影响。 通过使用保护层，可以在大气中自由进行光电面板沉积处理之后的处理，从而简化整个处理。 结果，降低了制造成本，并且促进了使用大的光电阴极的装置或装置的制造。
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公开(公告)号：US20030047133A1
公开(公告)日：2003-03-13
申请号：US10113750
申请日：2002-04-01
Inventor： Keong-Su Lim , Sang-Su Kim
IPC: C23C014/00 , C23F001/00
CPC classification number: H01L21/67115 , C23C16/482 , C23C16/488
Abstract: A photo-induced process apparatus uses a transparent film instead of an optical window, to thereby reduce a light absorption loss by use of an optical window. The photo-induced process apparatus includes a reaction chamber housing having an opening on the central portion of an upper plate through which light is transmitted, and a support for supporting a sample and a substrate; a light source whose light emission plane faces the opening so that the light is irradiated into the reaction chamber through the opening; a transparent film installation and storage chamber housing located between the light emission plane of the light source and the reaction chamber opening, having an opening through which light is transmitted from the light source to the reaction chamber on the central portion of the upper plate and a lower plate, in which a lower plate is combined with the reaction chamber upper plate; a transparent film located horizontally in the transparent film installation and storage chamber housing, the transparent film transmitting the light from the light source; a first flange in which the light emission plane edge of the light source is welded along the circumference of the central opening; a second flange which is welded along the circumference of the installation and storage upper plate opening; an extension and contraction portion in which third flanges having the respective same size as those of the first and second flanges are welded on both ends thereof so that the first and second flanges are connected to the third flanges respectively in a manner of connecting the same sized flanges, to thereby make the light source, the transparent film installation and storage chamber housing, the reaction chamber housing in a single sealing space, and enable the light source to move up and down without breaking the vacuum; and a driving unit for moving the light source up and down. Thus, the light emitted from the light source, in particular, a vacuum ultra-violet light ray can be efficiently utilized. The photo-induced process apparatus is very simple and practical, and easily performs a photo-induced process with respect to a large-area substrate.
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