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公开(公告)号：US11255662B2
公开(公告)日：2022-02-22
申请号：US16610664
申请日：2018-08-14
Inventor： Young-sik Ghim , The-mahn Nguyen , Hyug-gyo Rhee
Abstract: The present disclosure is directed to a system and a method for compensating non-linear response characteristics in measuring the shape of an object using phase-shifting deflectomerty. More particularly, the present disclosure is directed to a method for compensating non-linear response characteristics in phase-shifting deflectometry including steps of: generating a pattern by a pattern generating portion and projecting the same to a measurement object; obtaining an image of a deformed pattern reflected from the measurement object by a detector; linearizing non-linear responses on the basis of a look up table considering non-linear response characteristics of the pattern generating portion and the detector by a compensation means; and compensating phase-shifting amounts generated due to non-linear response characteristics by the compensation means.
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公开(公告)号：US11906281B2
公开(公告)日：2024-02-20
申请号：US16610692
申请日：2018-01-26
Inventor： Young-sik Ghim , Hyug-gyo Rhee
CPC classification number: G01B11/0675 , G01B9/02044 , G01N21/55 , G02B27/14 , G01B2290/70
Abstract: The present disclosure relates to an apparatus and method for measuring the thickness and refractive index of a multilayer thin film by measuring angle-resolved spectral reflectance according to light polarization. According to an exemplary embodiment of the present disclosure, the apparatus and method for measuring the thickness and refractive index of a multilayer structure using angle-resolved spectroscopic reflectometry is capable of measuring and analyzing thickness and refractive index of each layer of a structure having a multilayer thin film through an s-polarized imaging and a p-polarized imaging of the reflective light located in a back focal plane of an objective lens which are acquired through an angle-resolved spectral imaging acquisition part.
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公开(公告)号：US20210341283A1
公开(公告)日：2021-11-04
申请号：US16610692
申请日：2018-01-26
Inventor： Young-sik Ghim , Hyug-gyo Rhee
Abstract: The present disclosure relates to an apparatus and method for measuring the thickness and refractive index of a multilayer thin film by measuring angle-resolved spectral reflectance according to light polarization. According to an exemplary embodiment of the present disclosure, the apparatus and method for measuring the thickness and refractive index of a multilayer structure using angle-resolved spectroscopic reflectometry is capable of measuring and analyzing thickness and refractive index of each layer of a structure having a multilayer thin film through an s-polarized imaging and a p-polarized imaging of the reflective light located in a back focal plane of an objective lens which are acquired through an angle-resolved spectral imaging acquisition part.
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公开(公告)号：US20210172731A1
公开(公告)日：2021-06-10
申请号：US16610664
申请日：2018-08-14
Inventor： Young-sik Ghim , The-mahn Nguyen , Hyug-gyo Rhee
Abstract: The present disclosure is directed to a system and a method for compensating non-linear response characteristics in measuring the shape of an object using phase-shifting deflectometry. More particularly, the present disclosure is directed to a method for compensating non-linear response characteristics in phase-shifting deflectometry including steps of: generating a pattern by a pattern generating portion and projecting the same to a measurement object; obtaining an image of a deformed pattern reflected from the measurement object by a detector; linearizing non-linear responses on the basis of a look up table considering non-linear response characteristics of the pattern generating portion and the detector by a compensation means; and compensating phase-shifting amounts generated due to non-linear response characteristics by the compensation means.
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