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公开(公告)号:US20210404080A1
公开(公告)日:2021-12-30
申请号:US17107251
申请日:2020-11-30
Inventor: Jun Hwan MOON , Seung Hyun KIM , Tae Soon KIM , Yoo Sang JEON , Young Keun KIM
IPC: C25D3/02 , C23C16/06 , C23C16/455 , C25D7/06
Abstract: Disclosed is a technical idea of forming ruthenium and ruthenium-cobalt alloy nanowires having various diameters using electroplating. More particularly, a technology of forming ruthenium and ruthenium-cobalt alloy nanowires on a porous template, on pores of which nanotubes are deposited using atomic layer deposition (ALD), using electroplating, and annealing the ruthenium and ruthenium-cobalt alloy nanowires to form ruthenium-cobalt alloy nanowires having various diameters.