公开(公告)号：US06338934B1

公开(公告)日：2002-01-15

申请号：US09383452

申请日：1999-08-26

申请人： Kuang-Jung R. Chen ,  Mark C. Hakey ,  Steven J. Holmes ,  Wu-Song Huang ,  Paul A. Rabidoux

发明人： Kuang-Jung R. Chen ,  Mark C. Hakey ,  Steven J. Holmes ,  Wu-Song Huang ,  Paul A. Rabidoux

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/095 ,  Y10S430/115 ,  Y10S430/12

摘要： A photo resist composition contains a polymer resin, a first photo acid generator (PAG) requiring a first dose of actinic energy to generate a first photo acid, and a photo base generator (PBG) requiring a second dose of actinic energy, different from the first dose, to generate a photo base. The amounts and types of components in the photo resist are selected to produce a hybrid resist image. Either the first photo acid or photo base acts as a catalyst for a chemical transformation in the resist to induce a solubility change. The other compound is formulated in material type and loading in the resist such that it acts as a quenching agent. The catalyst is formed at low doses to induce the solubility change and the quenching agent is formed at higher doses to counterbalance the presence of the catalyst. Accordingly, the same frequency doubling effect of conventional hybrid resist compositions may be obtained, however, either a line or a space may be formed at the edge of an aerial image. Feature size may also be influenced by incorporating a quenching agent into the resist composition that does not require photo generation.

摘要翻译： 光致抗蚀剂组合物包含聚合物树脂，需要第一剂量的光化能以产生第一光酸的第一光酸产生剂（PAG）和需要第二剂量的光化能的光生碱剂（PBG），其不同于 第一剂量，以产生照相。 选择光抗蚀剂中组分的量和类型以产生混合抗蚀剂图像。 第一光酸或光碱作为抗蚀剂中化学转化的催化剂，以引起溶解度变化。 将另一种化合物配制成材料类型并加载到抗蚀剂中，使其用作淬火剂。 催化剂以低剂量形成以诱导溶解度变化，并且以较高剂量形成猝灭剂以平衡催化剂的存在。 因此，可以获得常规混合抗蚀剂组合物的相同的倍频效果，然而，可以在空间图像的边缘处形成线或空间。 通过将不需要光生成的抗蚀剂组合物中的淬火剂并入也可能影响特征尺寸。