Method and apparatus for designing patterning system based on patterning fidelity
    1.
    发明授权
    Method and apparatus for designing patterning system based on patterning fidelity 有权
    基于图案保真度设计图案化系统的方法和装置

    公开(公告)号:US08490033B2

    公开(公告)日:2013-07-16

    申请号:US13478131

    申请日:2012-05-23

    Abstract: A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.

    Abstract translation: 提供了一种将图形保真度直接结合到图案化系统的设计中的方法。 根据一组设计参数模拟目标图案的生产结果,以获得模拟图案。 将目标图案与模拟图案进行比较以获得图案保真度,并且根据目标图案保真度来调整图案化系统的设计参数的值,以优化图案化系统的一组设计参数的值 。

    METHOD AND APPARATUS FOR DESIGNING PATTERNING SYSTEM BASED ON PATTERNING FIDELITY
    2.
    发明申请
    METHOD AND APPARATUS FOR DESIGNING PATTERNING SYSTEM BASED ON PATTERNING FIDELITY 有权
    基于图案设计方法和设计方法

    公开(公告)号:US20130024823A1

    公开(公告)日:2013-01-24

    申请号:US13478131

    申请日:2012-05-23

    Abstract: A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.

    Abstract translation: 提供了一种将图形保真度直接结合到图案化系统的设计中的方法。 根据一组设计参数模拟目标图案的生产结果,以获得模拟图案。 将目标图案与模拟图案进行比较以获得图案保真度,并且根据目标图案保真度来调整图案化系统的设计参数的值,以优化图案化系统的一组设计参数的值 。

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