公开(公告)号：US20120090546A1

公开(公告)日：2012-04-19

申请号：US13260271

申请日：2009-03-26

申请人： Kyung Bin Bae ,  Jun Seo Rho ,  Whang Sin Cho ,  Jin Haon Kwon ,  Jong Ha Lee ,  You Hyun Kim ,  Hyung Seok Yoon

发明人： Kyung Bin Bae ,  Jun Seo Rho ,  Whang Sin Cho ,  Jin Haon Kwon ,  Jong Ha Lee ,  You Hyun Kim ,  Hyung Seok Yoon

IPC分类号： C23C16/448 ,  H05B1/00

CPC分类号： H01L21/67115 ,  C23C14/243 ,  C23C14/26 ,  H01L21/67109

摘要： Provided are a source supplying unit and a method for supplying a source. The source supplying unit includes a pot configured to store a source material, an injector communicating with the pot to inject the source material evaporated from the pot, a high frequency coil part surrounding an outside of the pot, and a resistance-type heating part disposed at an outside of the injector. Since a high frequency induction heating method and a resistance-type heating method are combined to evaporate a source material to be supplied, a large amount of source material can be used, and the thickness and quality of a thin film can be easily controlled.

摘要翻译： 提供源提供单元和用于提供源的方法。 源供给单元包括：配置为存储源材料的罐，与罐连通以喷射从罐蒸发的源材料的喷射器，围绕锅外部的高频线圈部，以及设置在电阻型加热部 在注射器的外部。 由于组合高频感应加热方法和电阻式加热方法来蒸发待供应的源材料，所以可以使用大量的源材料，并且可以容易地控制薄膜的厚度和质量。