公开(公告)号：US20120090546A1

公开(公告)日：2012-04-19

申请号：US13260271

申请日：2009-03-26

申请人： Kyung Bin Bae ,  Jun Seo Rho ,  Whang Sin Cho ,  Jin Haon Kwon ,  Jong Ha Lee ,  You Hyun Kim ,  Hyung Seok Yoon

发明人： Kyung Bin Bae ,  Jun Seo Rho ,  Whang Sin Cho ,  Jin Haon Kwon ,  Jong Ha Lee ,  You Hyun Kim ,  Hyung Seok Yoon

IPC分类号： C23C16/448 ,  H05B1/00

CPC分类号： H01L21/67115 ,  C23C14/243 ,  C23C14/26 ,  H01L21/67109

摘要： Provided are a source supplying unit and a method for supplying a source. The source supplying unit includes a pot configured to store a source material, an injector communicating with the pot to inject the source material evaporated from the pot, a high frequency coil part surrounding an outside of the pot, and a resistance-type heating part disposed at an outside of the injector. Since a high frequency induction heating method and a resistance-type heating method are combined to evaporate a source material to be supplied, a large amount of source material can be used, and the thickness and quality of a thin film can be easily controlled.

摘要翻译： 提供源提供单元和用于提供源的方法。 源供给单元包括：配置为存储源材料的罐，与罐连通以喷射从罐蒸发的源材料的喷射器，围绕锅外部的高频线圈部，以及设置在电阻型加热部 在注射器的外部。 由于组合高频感应加热方法和电阻式加热方法来蒸发待供应的源材料，所以可以使用大量的源材料，并且可以容易地控制薄膜的厚度和质量。

公开(公告)号：US20120291708A1

公开(公告)日：2012-11-22

申请号：US13522841

申请日：2011-01-21

申请人： Byeong Min Bak ,  Doo Won Gong ,  Jin Haon Kwon ,  Yong Beom Jung ,  Whang Sin Cho ,  Sung Jae Jung

发明人： Byeong Min Bak ,  Doo Won Gong ,  Jin Haon Kwon ,  Yong Beom Jung ,  Whang Sin Cho ,  Sung Jae Jung

IPC分类号： C23C16/44

CPC分类号： C23C14/56 ,  C23C16/4412 ,  C23C16/54

摘要： Disclosed is a vacuum deposition apparatus, which comprises: a chamber mounted with a source for jetting an application material in the gaseous state for deposition onto a substrate; heaters formed to the inner wall of the chamber and internal parts; a pump for aspirating air out of the chamber; and a plurality of cold traps interposed between the chamber and the pump for cooling the air aspirated by the pump to remove the application material from the air. According to the vacuum deposition apparatus, it is possible to prevent direct damage to the internal parts or the inner wall of the chamber by application materials accumulated thereon. Additionally, the plurality of cold traps prevent pollution and stoppage in continuous production which allows substitution to be carried out without stoppage. Therefore, productivity may be improved compared to other equipment with similar specifications.

摘要翻译： 公开了一种真空沉积设备，其包括：安装有用于喷射处于气态的涂布材料的源的腔室，用于沉积到衬底上; 加热器形成在腔室的内壁和内部部件上; 用于将空气抽出室的泵; 以及插入在所述室和所述泵之间的多个冷阱，用于冷却由所述泵抽吸的空气以从所述空气中除去所述施加材料。 根据真空沉积设备，可以通过积聚在其上的施加材料来防止对室的内部部件或内壁的直接损坏。 此外，多个冷阱能够防止连续生产中的污染和停止，从而能够不间断地进行替代。 因此，与具有相似规格的其他设备相比，可以提高生产率。

公开(公告)号：US20150129420A1

公开(公告)日：2015-05-14

申请号：US13582474

申请日：2012-06-22

申请人： Sang Hyun Park ,  Dong Hyun Lee ,  Hyun Pil Oh ,  Kwang Jin Jeon ,  Jin Haon Kwon ,  Sung Jin Park

发明人： Sang Hyun Park ,  Dong Hyun Lee ,  Hyun Pil Oh ,  Kwang Jin Jeon ,  Jin Haon Kwon ,  Sung Jin Park

IPC分类号： H01J37/32

CPC分类号： H01J37/32807 ,  B01J3/002 ,  C23C14/06 ,  C23C14/243

摘要： Disclosed is a substrate processing system with a damage preventing function, comprising: a fluid tank which stores fluid; a chamber which receives the fluid from the fluid tank and provides a space where a substrate is processed; a pipe which connects the fluid tank and the chamber and through which the fluid flows; and a damage preventing unit which allows the fluid tank to be changed in position corresponding to thermal expansion caused in the pipe by receiving heat as the fluid flows in the pipe.With this, the substrate processing system with the damage preventing function for allowing the fluid tank to correspond to change in volume due to the thermal expansion of the pipe and preventing the fluid tank from damage is provided.

摘要翻译： 公开了一种具有防损功能的基板处理系统，包括：存储流体的流体箱; 接收来自流体箱的流体并提供衬底被处理的空间的腔室; 连接流体箱和室的管道，流体流过该管道; 以及损坏防止单元，其允许流体箱在流体在管中流动时通过接受热而在管道中引起的热膨胀相应地改变位置。 由此，提供了具有防止损伤的功能的基板处理系统，用于允许流体槽由于管道的热膨胀而导致体积变化，并且防止流体箱损坏。