公开(公告)号：US10760944B2

公开(公告)日：2020-09-01

申请号：US16056980

申请日：2018-08-07

Applicant: LAM RESEARCH CORPORATION

Inventor： Evangelos T. Spyropoulos ,  Piyush Agarwal ,  James Leung ,  Seyed Hossein Hashemi Ghermezi ,  Iqbal Shareef

IPC: G01F1/34 ,  G01F25/00

Abstract: A gas flow metrology system for a substrate processing system includes N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer. N mass flow controllers are connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively. N secondary valves selectively flow gas from the N mass flow controllers, respectively. A gas flow path connects the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines. A controller is configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.