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    Hybrid flow metrology for improved chamber matching
    1.
    发明授权
    Hybrid flow metrology for improved chamber matching 有权

    公开(公告)号：US10760944B2

    公开(公告)日：2020-09-01

    申请号：US16056980

    申请日：2018-08-07

    Applicant: LAM RESEARCH CORPORATION

    Inventor： Evangelos T. Spyropoulos ,  Piyush Agarwal ,  James Leung ,  Seyed Hossein Hashemi Ghermezi ,  Iqbal Shareef

    IPC: G01F1/34 ,  G01F25/00

    Abstract: A gas flow metrology system for a substrate processing system includes N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer. N mass flow controllers are connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively. N secondary valves selectively flow gas from the N mass flow controllers, respectively. A gas flow path connects the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines. A controller is configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.

    Configuration independent gas delivery system
    2.
    发明授权
    Configuration independent gas delivery system 有权

    公开(公告)号：US10128087B2

    公开(公告)日：2018-11-13

    申请号：US14680244

    申请日：2015-04-07

    Applicant: Lam Research Corporation

    Inventor： Mark Taskar ,  Iqbal Shareef

    IPC: H01J37/00 ,  H01J37/32 ,  B01F3/02 ,  B01F5/04

    Abstract: A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus includes a mixing manifold having a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing point of the mixing manifold; and optionally a plurality of gas supplies in communication with the plurality of gas inlets on the surface of the mixing manifold. A method of supplying gas to a processing chamber of a plasma processing apparatus using such a gas delivery apparatus involves providing a plurality of gas supplies in communication with a plurality of gas inlets on a surface of a mixing manifold; flowing at least two different gases from the plurality of gas supplies to the mixing manifold to create a first mixed gas; and supplying the first mixed gas to a plasma processing chamber coupled downstream of the mixing manifold.

    GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL
    4.
    发明申请
    GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL 审中-公开
    气体输送装置，包括用于气体流量控制的气体分离器

    公开(公告)号：US20160111258A1

    公开(公告)日：2016-04-21

    申请号：US14886458

    申请日：2015-10-19

    Applicant: Lam Research Corporation

    Inventor： Mark Taskar ,  Iqbal Shareef ,  Anthony Zemlock ,  Ryan Bise ,  Nathan Kugland

    IPC: H01J37/32 ,  H01L21/67 ,  C23C14/22 ,  C23C16/50 ,  C23C16/455

    CPC classification number: H01J37/3244 ,  C23C14/22 ,  C23C16/45544 ,  C23C16/45561 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32009 ,  H01J37/32449 ,  H01L21/31116 ,  H01L21/67069

    Abstract: A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.

    Abstract translation: 用于通过至少第一，第二和第三气体注入区域引入的气体处理衬底的等离子体处理系统的气体供应输送装置包括工艺气体供应入口和调节气体入口。 混合歧管包括与工艺气体供应流体连通的气棒和与调节气体供应流体连通的调节气棒。 第一气体出口将气体输送到第一气体注入区域，第二气体出口将气体输送到第二气体注入区域，而第三气体出口将气体输送到第三气体注入区域。 气体分配器与混合歧管流体连通，并且包括第一阀装置，其将离开混合歧管的混合气体分解成供应到第一气体出口的第一混合气体和供应到第二气体出口的第二混合气体，和/或 第三个出口。

    METROLOGY METHOD FOR TRANSIENT GAS FLOW
    7.
    发明申请
    METROLOGY METHOD FOR TRANSIENT GAS FLOW 有权
    瞬态气体流量计方法

    公开(公告)号：US20140343875A1

    公开(公告)日：2014-11-20

    申请号：US13896108

    申请日：2013-05-16

    Applicant: Lam Research Corporation

    Inventor： Evangelos Spyropoulos ,  Iqbal Shareef

    IPC: G01F1/34

    CPC classification number: G01F1/34 ,  B01J2219/00216 ,  G01F25/0007 ,  G01F25/0038 ,  G01F25/0092

    Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value. A line of best fit of the ratio values is determined within at least one group, and then the transient flow rate of the flowed process gas is calculated using a pressure rate of rise technique wherein the pressure rate of rise technique utilizes a ratio value determined from the line of best fit for at least one time value within the at least one group.

    Abstract translation: 一种计算流动工艺气体的瞬态流量的方法包括使工艺气体通过质量流量控制器流入已知体积的腔室并测量连续的数据采样点，其包括压力数据，温度数据和每个连续数据的时间值 采样点。 识别连续数据采样点的组，其中每个组与另一组共享一个或多个连续的数据采样点，并且为每个连续数据采样点计算每个连续数据采样点的比值，其中每个比值是压力数据和乘积之间的比率 的每个时间值的温度和气体压缩性数据。 在至少一组内确定比值的最佳拟合线，然后使用上升技术的压力比计算流动过程气体的瞬时流量，其中上升压力的技术利用从 该线最适合至少一个组内的至少一个时间值。

    Gas supply delivery arrangement including a gas splitter for tunable gas flow control
    8.
    发明授权
    Gas supply delivery arrangement including a gas splitter for tunable gas flow control 有权

    公开(公告)号：US10431431B2

    公开(公告)日：2019-10-01

    申请号：US14886458

    申请日：2015-10-19

    Applicant: Lam Research Corporation

    Inventor： Mark Taskar ,  Iqbal Shareef ,  Anthony Zemlock ,  Ryan Bise ,  Nathan Kugland

    IPC: H01J37/32 ,  C23C16/455 ,  C23C16/52 ,  C23C14/22 ,  H01L21/67 ,  C23C16/50 ,  H01L21/311

    Abstract: A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.

    Corrosion sensor retainer assembly apparatus and method for detecting corrosion
    9.
    发明授权
    Corrosion sensor retainer assembly apparatus and method for detecting corrosion 有权

    公开(公告)号：US09704761B2

    公开(公告)日：2017-07-11

    申请号：US14489148

    申请日：2014-09-17

    Applicant: Lam Research Corporation

    Inventor： Mark Taskar ,  Iqbal Shareef ,  Anthony Zemlock

    IPC: G01N17/02 ,  H01L21/66 ,  H01L21/67

    CPC classification number: H01L22/10 ,  H01L21/67017

    Abstract: A corrosion sensor retainer assembly and method for predicting and detecting corrosion within a gas delivery system of a semiconductor substrate processing apparatus. The corrosion sensor retainer assembly comprises a laminate that includes a first insulating layer with a first port and a second insulating layer with a second port, wherein the first port and the second port are configured to retain a seal. The corrosion sensor retainer assembly includes a conductor housed within the laminate. The conductor forms a path that extends around the first port and the second port. At least a portion of the conductor has an exposed surface with a property that changes in the presence of corrosive gas or acid.

    Cluster mass flow devices and multi-line mass flow devices incorporating the same
    10.
    发明授权
    Cluster mass flow devices and multi-line mass flow devices incorporating the same 有权
    集群质量流量装置和结合其的多线质量流量装置

    公开(公告)号：US09335768B2

    公开(公告)日：2016-05-10

    申请号：US14025162

    申请日：2013-09-12

    Applicant: Lam Research Corporation

    Inventor： Mark Taskar ,  Iqbal Shareef

    IPC: F16K27/00 ,  G05D7/06

    CPC classification number: G05D7/0641 ,  F16K27/003 ,  G05D7/0652 ,  Y10T137/2499

    Abstract: A multi-line mass flow device configured for controlled delivery of two or more fluids into a process chamber. The multi-line mass flow device comprises a cluster mass flow control manifold and a multi-inlet manifold. The cluster mass flow control manifold comprises a controller, a gas manifold mounting block, and two or more gas flow control stations. The multi-inlet manifold comprises a multi-inlet mounting block, and two or more isolation valves mounted on the multi-inlet mounting block.

    Abstract translation: 多线质量流量装置，被配置为将两种或多种流体控制输送到处理室中。 多线质量流量装置包括集束质量流量控制歧管和多入口歧管。 集群质量流量控制歧管包括控制器，气体歧管安装块和两个或更多个气体流量控制站。 多入口歧管包括多入口安装块和安装在多入口安装块上的两个或更多隔离阀。

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