公开(公告)号：US20130248870A1

公开(公告)日：2013-09-26

申请号：US13895677

申请日：2013-05-16

Applicant: LG DISPLAY CO., LTD.

Inventor： Young-Ki JUNG ,  Seok-Woo LEE ,  Kum-Mi OH ,  Dong-Cheon SHIN ,  In-Hyuk SONG ,  Han-Seok LEE ,  Won-Keun PARK

IPC: H01L27/088

CPC classification number: H01L27/088 ,  G02F2001/134372 ,  G02F2001/136236 ,  H01L27/1248 ,  H01L27/1288 ,  H01L29/66757 ,  H01L29/78633

Abstract: A method of manufacturing an array substrate for a fringe field switching mode liquid crystal display includes: forming an auxiliary insulating layer on a second passivation layer and having a first thickness; forming first and second photoresist patterns on the auxiliary insulating layer and having second and third thicknesses, respectively, the second thickness greater than the third thickness; etching the auxiliary insulating layer, the second passivation layer and a first passivation layer to form a drain contact hole; performing an ashing to remove the second photoresist pattern and expose the auxiliary insulating layer therebelow; performing a dry etching to remove the auxiliary insulating layer not covered by the first photoresist pattern and expose the first passivation layer and to form an insulating pattern below the first photoresist pattern, the insulating pattern and the first photoresist pattern forming an undercut shape; forming a transparent conductive material layer having a fourth thickness less than the first thickness; and performing a lift-off process to remove the first photoresist pattern and the transparent conductive material layer thereon together and form a pixel electrode as a remaining portion of the transparent conductive material layer.

Abstract translation: 一种制造用于边缘场开关模式液晶显示器的阵列基板的方法包括：在第二钝化层上形成具有第一厚度的辅助绝缘层; 在所述辅助绝缘层上形成第一和第二光致抗蚀剂图案，并且分别具有第二和第三厚度，所述第二厚度大于所述第三厚度; 蚀刻辅助绝缘层，第二钝化层和第一钝化层以形成漏极接触孔; 执行灰化以去除第二光致抗蚀剂图案并在其下方露出辅助绝缘层; 执行干蚀刻以去除未被第一光致抗蚀剂图案覆盖的辅助绝缘层，并暴露第一钝化层并在第一光致抗蚀剂图案下方形成绝缘图案，绝缘图案和第一光致抗蚀剂图案形成底切形状; 形成具有小于第一厚度的第四厚度的透明导电材料层; 并且执行剥离处理以将第一光致抗蚀剂图案和透明导电材料层去除在一起，并形成作为透明导电材料层的剩余部分的像素电极。