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公开(公告)号：US10073416B2
公开(公告)日：2018-09-11
申请号：US14695610
申请日：2015-04-24
发明人： Hyungseok Bang , Heejin Im , Guensik Lee , Friedrich-Karl Bruder , Thomas Peter Facke , Marc-Stephan Weiser , Rainer Hagen , Thomas Rolle , Horst Berneth , Dennis Honel , Günther Walze
CPC分类号： G03H1/0402 , G02B5/32 , G03H1/0252 , G03H1/0272 , G03H1/04 , G03H1/0486 , G03H2001/026 , G03H2001/0264 , G03H2001/043 , G03H2001/0439 , G03H2240/43 , G03H2240/52 , G03H2240/55 , G03H2270/11
摘要： The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behavior of the recording stack during the irradiating step.
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公开(公告)号：US10921751B2
公开(公告)日：2021-02-16
申请号：US16058834
申请日：2018-08-08
发明人： Hyungseok Bang , Heejin Im , Guensik Lee , Friedrich-Karl Bruder , Thomas Peter Facke , Marc-Stephan Weiser , Rainer Hagen , Thomas Rolle , Horst Berneth , Dennis Honel , Günther Walze
摘要： The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
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