公开(公告)号：US09652563B2

公开(公告)日：2017-05-16

申请号：US14109141

申请日：2013-12-17

Applicant: LG INNOTEK CO., LTD.

Inventor： Woo Young Chang ,  Seung Heon Lee ,  Chi Goo Jun

IPC: G06F7/48 ,  G06F17/50 ,  G02F1/1343 ,  G06F3/044 ,  G02F1/1333

CPC classification number: G06F17/50 ,  G02F1/13338 ,  G02F1/134309 ,  G06F3/044 ,  G06F2203/04112

Abstract: Disclosed are a method of designing a random pattern, an apparatus for designing a random pattern and an optical substrate including a random pattern according to the same method. The method includes setting a plurality of unit valid pattern regions in a pattern design region; forming a random point coordinate in the unit valid pattern region; and connecting the random point coordinate in the unit valid pattern region to other random point coordinates adjacent to the random point coordinate in a first direction or a second direction.