公开(公告)号：US20190259951A1

公开(公告)日：2019-08-22

申请号：US16332910

申请日：2017-08-22

Applicant: LG INNOTEK CO., LTD.

Inventor： Dong Mug SEONG ,  Jong Min YUN ,  Su Hyeon CHO ,  Hae Sik KIM ,  Tae Hoon HAN ,  Hyo Won SON ,  Sang Yu LEE ,  Sang Beum LEE

IPC: H01L51/00 ,  C23F1/02 ,  H01L51/56 ,  H01L21/027 ,  H01L21/203 ,  C23C14/04

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

公开(公告)号：US20130162572A1

公开(公告)日：2013-06-27

申请号：US13724449

申请日：2012-12-21

Applicant: LG Innotek Co., Ltd.

Inventor： Myung Jae KWON ,  Sang Beum LEE

IPC: G06F3/041

CPC classification number: G06F3/041 ,  G06F3/017 ,  G06F2203/04103

Abstract: Disclosed is a touch panel. The touch panel includes a transparent window; a printed pattern disposed under the transparent widow and spaced apart from the transparent window; and an intermediate layer between the transparent window and the printed pattern.

Abstract translation: 公开了一种触摸面板。 触摸面板包括透明窗口; 布置在透明寡妇下面并与透明窗隔开的印刷图案; 以及透明窗和印刷图案之间的中间层。

公开(公告)号：US20220190250A1

公开(公告)日：2022-06-16

申请号：US17688129

申请日：2022-03-07

Applicant: LG INNOTEK CO., LTD.

Inventor： Dong Mug SEONG ,  Jong Min YUN ,  Su Hyeon CHO ,  Hae Sik KIM ,  Tae Hoon HAN ,  Hyo Won SON ,  Sang Yu LEE ,  Sang Beum LEE

IPC: H01L51/00 ,  H01L51/56 ,  H01L21/475 ,  C23C14/04 ,  H01L21/203 ,  C23F1/02 ,  H01L21/027

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.