公开(公告)号：US20020170822A1

公开(公告)日：2002-11-21

申请号：US10076097

申请日：2002-02-15

Applicant: LG. Philips LCD Co., Ltd.

Inventor： Soo Chang Chang

IPC: C23C014/00

CPC classification number: H01J37/3402 ,  C23C14/35

Abstract: A sputtering system for depositing a thin film on a substrate includes a vacuum chamber, a support for supporting the substrate in the vacuum chamber, a target arranged to oppose the support, a fixed plate formed on a first side of the target, and a plurality of electromagnets formed on the fixed plate in a cell pattern.

Abstract translation: 用于在衬底上沉积薄膜的溅射系统包括真空室，用于在真空室中支撑衬底的支撑体，与支撑体相对布置的靶，形成在靶的第一侧上的固定板，以及多个 以电池图案形成在固定板上的电磁体。