公开(公告)号：US20020164888A1

公开(公告)日：2002-11-07

申请号：US10138639

申请日：2002-05-06

Applicant: LG. Philips LCD Co., Ltd.

Inventor： Byung Tae Roh ,  You Shin Ahn

IPC: H01L021/302 ,  H01L021/461

CPC classification number: H01L31/1884 ,  C09K13/06 ,  G02F1/13439 ,  H01L27/124 ,  Y02E10/50

Abstract: An etchant for patterning indium tin oxide, wherein the etchant is a mixed solution of HCl, CH3COOH, and water, and a method of fabricating a liquid crystal display device are disclosed in the present invention. The method includes forming a gate electrode on a substrate, forming a gate insulating layer and an amorphous silicon layer on the gate electrode including the substrate, forming an active area by patterning the amorphous silicon layer, forming a source electrode and a drain electrode on the active area, forming a passivation layer on the source electrode and the drain electrode and the gate insulating layer, forming a contact hole exposing a part of the drain electrode, forming an indium tin oxide layer on the passivation layer, and forming an indium tin oxide electrode by selectively etching the indium tin oxide layer using a mixed solution of HCl, CH3COOH, and water as an etchant.

Abstract translation: 在本发明中公开了用于图案化铟锡氧化物的蚀刻剂，其中所述蚀刻剂是HCl，CH 3 COOH和水的混合溶液，以及制造液晶显示装置的方法。 该方法包括在衬底上形成栅电极，在包括衬底的栅电极上形成栅极绝缘层和非晶硅层，通过图案化非晶硅层形成有源区，形成源电极和漏电极 在源电极和漏电极以及栅极绝缘层上形成钝化层，形成露出一部分漏电极的接触孔，在钝化层上形成氧化铟锡层，形成氧化铟锡 通过使用HCl，CH 3 COOH和水的混合溶液作为蚀刻剂选择性地蚀刻氧化铟锡层。

公开(公告)号：US20040195204A1

公开(公告)日：2004-10-07

申请号：US10642174

申请日：2003-08-18

Applicant: LG. Philips LCD Co., Ltd.

Inventor： You Shin Ahn ,  Hu Kag Lee

IPC: C30B033/00

CPC classification number: G02F1/13439

Abstract: A pixel electrode employs a transparent electrode made from indium-zinc-oxide (IZO) that is capable of preventing damage and bending thereof. In a liquid crystal display device containing pixel electrodes, the transparent electrode is made from indium-zinc-oxide (IZO) having an amorphous structure so that it can be etched within a short period of time with a low concentration of etchant. Accordingly, it is possible to prevent damage and bending of the transparent electrode upon the patterning thereof.

Abstract translation: 像素电极采用能够防止其损伤和弯曲的氧化铟锌（IZO）制成的透明电极。 在包含像素电极的液晶显示装置中，透明电极由具有非晶结构的氧化铟锌（IZO）制成，使得可以在较低浓度的蚀刻剂下在短时间内进行蚀刻。 因此，可以防止透明电极在其图案化时的损伤和弯曲。