Abstract:
A method for forming a pattern, including the steps of preparing a clichnull having a recess thereon corresponding to a position of a pattern, filling one of resist and ink within the recess of the clichnull, affixing a substrate on which the pattern is to be formed on a loading plate, aligning the loading plate on the clichnull, attaching the substrate on the loading plate to the clichnull, and separating the substrate on the loading plate from the clichnull.