公开(公告)号：US20190352777A1

公开(公告)日：2019-11-21

申请号：US15982913

申请日：2018-05-17

Applicant: Lam Research Corporation

Inventor： Nagraj Shankar ,  Jeffrey D. Womack ,  Meliha Gozde Rainville ,  Emile C. Draper ,  Pankaj G. Ramnani ,  Feng Bi ,  Pengyi Zhang ,  Elham Mohimi ,  Kapu Sirish Reddy

IPC: C23C16/455 ,  H01L21/02

Abstract: Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.

公开(公告)号：US20200063261A1

公开(公告)日：2020-02-27

申请号：US16672364

申请日：2019-11-01

Applicant: Lam Research Corporation

Inventor： Nagraj Shankar ,  Jeffrey D. Womack ,  Meliha Gozde Rainville ,  Emile C. Draper ,  Pankaj G. Ramnani ,  Feng Bi ,  Pengyi Zhang ,  Elham Mohimi ,  Kapu Sirish Reddy

IPC: C23C16/455 ,  H01L21/02

Abstract: Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.

公开(公告)号：US10745806B2

公开(公告)日：2020-08-18

申请号：US16672364

申请日：2019-11-01

Applicant: Lam Research Corporation

Inventor： Nagraj Shankar ,  Jeffrey D. Womack ,  Meliha Gozde Rainville ,  Emile C. Draper ,  Pankaj G. Ramnani ,  Feng Bi ,  Pengyi Zhang ,  Elham Mohimi ,  Kapu Sirish Reddy

IPC: H01L21/02 ,  C23C16/455

Abstract: Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.

公开(公告)号：US10472716B1

公开(公告)日：2019-11-12

申请号：US15982913

申请日：2018-05-17

Applicant: Lam Research Corporation

Inventor： Nagraj Shankar ,  Jeffrey D. Womack ,  Meliha Gozde Rainville ,  Emile C. Draper ,  Pankaj G. Ramnani ,  Feng Bi ,  Pengyi Zhang ,  Elham Mohimi ,  Kapu Sirish Reddy

IPC: C23C16/455 ,  H01L21/02

Abstract: Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.