-
公开(公告)号:US20230282465A1
公开(公告)日:2023-09-07
申请号:US18011445
申请日:2021-08-31
发明人: John C. Valcore, JR. , Travis Joseph Wong , Ying Wu , Sandeep Mudunuri , Bostjan Pust , Shreeram Jyoti Dash
IPC分类号: H01J37/32
CPC分类号: H01J37/3299 , H01J37/32146 , H01J2237/24564
摘要: A method for controlling a plasma tool is described. The method includes receiving, by a processor, a first set of metric data from a plasma tool. The method further includes analyzing the first set of metric data to determine a first location and a first time window for capturing of a second set of metric data. The method includes providing, by the processor, the first location and the first time window to a data processing system of the plasma tool. The method also includes receiving the second set of metric data captured at the first location and for the first time window. The method includes analyzing the second set of metric data to generate variable data and controlling the plasma tool according to the variable data.
-
公开(公告)号:US20230207267A1
公开(公告)日:2023-06-29
申请号:US17926574
申请日:2021-05-10
IPC分类号: H01J37/32
CPC分类号: H01J37/32183 , H01J37/32926
摘要: Systems and methods for compressing data are described. One of the methods includes receiving a plurality of measurement signals from one or more sensors coupled to a radio frequency (RF) transmission path of a plasma tool. The RF transmission path is from an output of an RF generator to an electrode of a plasma chamber. The method includes converting the plurality of measurement signals from an analog form to a digital form to sample data and processing the data to reduce an amount of the data. The amount of the data is compressed to output compressed data. The method includes sending the compressed data to a controller for controlling the plasma tool.
-