公开(公告)号：US4188497A

公开(公告)日：1980-02-12

申请号：US872132

申请日：1978-01-25

申请人： Leendert Huizer ,  Dirk J. Van Namen ,  Pieter J. D. Oranje

发明人： Leendert Huizer ,  Dirk J. Van Namen ,  Pieter J. D. Oranje

IPC分类号： C07C37/50 ,  B01J27/00 ,  C07C27/00 ,  C07C37/86 ,  C07C39/07 ,  C07C67/00 ,  C07C37/06 ,  C07C37/22

CPC分类号： C07C37/86

摘要： A process is described for the removal of halogen residues from a reaction mixture containing 3,5-xylenol and halogen residues, produced via the heating of isophorone at a temperature of about 450.degree. C. to about 650.degree. C. in the presence of a homogeneous halogen-containing catalyst, said removal being accomplished by contacting the reaction mixture with a metal selected from the group consisting of zinc, iron, magnesium, cadmium, cobalt and nickel.

摘要翻译： 描述了从含有3,5-二甲苯酚和卤素残基的反应混合物中除去卤素残余物的方法，其通过在约450℃至约650℃的温度下在约450℃至约650℃的温度下加热异佛尔酮 均匀含卤素催化剂，所述除去是通过使反应混合物与选自锌，铁，镁，镉，钴和镍的金属接触来实现的。