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公开(公告)号：US20110182801A1
公开(公告)日：2011-07-28
申请号：US13119098
申请日：2009-10-01
IPC分类号： C01B7/04
CPC分类号： C01B7/04 , B01J23/12 , B01J23/626 , B01J35/0006 , B01J35/023 , C01B7/07
摘要： The present invention relates to a multistage process for preparing chlorine by catalytic gas phase oxidation of hydrogen chloride with oxygen, in which the conversion is performed over at least two different catalyst beds under adiabatic conditions, and to a reactor system for performing the process.
摘要翻译： 本发明涉及通过用氧气对氯化氢进行催化气相氧化制备氯的多级方法，其中在绝热条件下在至少两种不同的催化剂床上进行转化，以及用于进行该方法的反应器系统。
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2.发明申请METHOD FOR PRODUCING GRAPHENE SOLUTIONS, GRAPHENE ALKALI METAL SALTS, AND GRAPHENE COMPOSITE MATERIALS 审中-公开生产石墨溶液的方法，石墨烯金属盐和石墨复合材料公开(公告)号：US20120256121A1
公开(公告)日：2012-10-11
申请号：US13508189
申请日：2010-11-08
CPC分类号： B82Y40/00 , B82Y30/00 , C01B32/19 , C01B32/194 , C01B32/196 , C01B2204/04
摘要： The present invention relates to a process for preparing graphene solutions by means of alkali metal salts, to graphene solutions, to processes for preparing graphene alkali metal salts, to graphene alkali metal salts and to graphene composite materials and to processes for producing the graphene composite materials.
摘要翻译： 本发明涉及通过碱金属盐制备石墨烯溶液，石墨烯溶液，制备石墨烯碱金属盐的方法，石墨烯碱金属盐和石墨烯复合材料的方法以及用于生产石墨烯复合材料的方法 。
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3.发明申请PROCESSES FOR THE OXIDATION OF CARBON MONOXIDE IN A GAS STREAM CONTAINING HCL 审中-公开在含有HCL的气体流中一氧化碳氧化的方法公开(公告)号：US20080267849A1
公开(公告)日：2008-10-30
申请号：US12110468
申请日：2008-04-28
IPC分类号： B01D53/34
CPC分类号： C07C263/10 , B01J23/626 , C01B7/04 , C01B7/0706 , C01B32/50 , C07C265/14
摘要： Processes comprising: providing a gas stream comprising hydrogen chloride and carbon monoxide; and oxidizing at least a portion of the carbon monoxide in the gas stream in the presence of a catalyst to form a product gas comprising hydrogen chloride and carbon dioxide; wherein the catalyst comprises tin dioxide and a ruthenium compound comprising at least one element selected from the group consisting of oxygen and chlorine.
摘要翻译： 方法包括：提供包含氯化氢和一氧化碳的气流; 以及在催化剂存在下氧化气流中至少一部分一氧化碳以形成包含氯化氢和二氧化碳的产物气体; 其中所述催化剂包含二氧化锡和包含至少一种选自氧和氯的元素的钌化合物。
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4.发明申请PROCESSES FOR THE ADSORPTIVE REMOVAL OF INORGANIC COMPONENTS FROM HYDROGEN CHLORIDE-CONTAINING GASES 审中-公开从含氯化物气体吸收去除无机成分的方法公开(公告)号：US20080257150A1
公开(公告)日：2008-10-23
申请号：US12103994
申请日：2008-04-16
IPC分类号： B01D53/14
CPC分类号： B01D53/04 , B01D2253/104 , B01D2253/106 , B01D2253/108 , B01D2253/306 , B01D2256/26 , B01D2257/60 , C01B7/0718
摘要： Processes for removing inorganic impurities from HCl-containing gases, which processes comprise: providing a crude gas stream comprising hydrogen chloride and at least one inorganic component; introducing the crude gas stream into an adsorber bed; adsorbing at least a portion of the at least one inorganic component from the crude gas stream on the adsorber bed to form a purified HCl gas, and removing the purified HCl gas from the adsorber bed.
摘要翻译： 用于从含HCl气体中除去无机杂质的方法，该方法包括：提供包含氯化氢和至少一种无机组分的粗气流; 将粗气流引入吸附床; 在所述吸附床上从粗气流中吸附至少一部分至少一种无机成分以形成纯化的HCl气体，以及从吸附床除去纯化的HCl气体。
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