专利检索 ap:("Lin-Chin Su" OR "Tzu-Ching Tsai" OR "Miin-Jiunn Jiang" OR "Hung-Chang Liao" OR "Jim Wang" OR "Chung Min Lin") AND inv:"Miin-Jiunn Jiang" 第 1 页

1.

发明授权
Method for fabricating LOCOS isolation having a planar surface which includes having the polish stop layer at a lower level than the LOCOS formation 有权
标题翻译：用于制造具有平坦表面的LOCOS隔离的方法，其包括使抛光停止层处于比LOCOS形成更低的水平

公开(公告)号：US06153482A

公开(公告)日：2000-11-28

申请号：US174091

申请日：1998-10-16

申请人： Lin-Chin Su , Tzu-Ching Tsai , Miin-Jiunn Jiang , Hung-Chang Liao , Jim Wang , Chung Min Lin

发明人： Lin-Chin Su , Tzu-Ching Tsai , Miin-Jiunn Jiang , Hung-Chang Liao , Jim Wang , Chung Min Lin

IPC分类号： H01L21/762 , H01L21/331 , H01L21/302 , H01L21/76

CPC分类号： H01L21/76205

摘要： A method for fabricating LOCOS isolation having a planar surface. The method utilizes a polysilicon spacer to prevent bird beak. The method adds the steps of forming a polishing stop layer and removing said edge-protrusion portion of the local oxide by chemical mechanical polishing.

摘要翻译： 一种用于制造具有平坦表面的LOCOS隔离的方法。该方法利用多晶硅间隔物来防止鸟嘴。该方法通过化学机械抛光添加形成抛光停止层并去除局部氧化物的边缘突出部分的步骤。