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公开(公告)号:US20210296846A1
公开(公告)日:2021-09-23
申请号:US16865739
申请日:2020-05-04
摘要: An optical element may include a plurality of subsurface induced scattering centers formed in the optical element, where the plurality of subsurface induced scattering centers scatter light passing through the optical element. In some implementations, the plurality of subsurface induced scattering centers may form a scattering region in the optical element. Additionally, or alternatively, the plurality of subsurface induced scattering centers may spatially vary transmission of light through the optical element. The optical element may be an optical waveguide, a bulk optic, and/or the like.
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公开(公告)号:US20210265801A1
公开(公告)日:2021-08-26
申请号:US16876708
申请日:2020-05-18
发明人: Martin H. MUENDEL , Richard D. FAULHABER , Michael LOVELADY , James J. MOREHEAD , Andreas OEHLER
IPC分类号: H01S3/094
摘要: An optical fiber may include a core in which core-guided light generated by one or more light sources propagates along a length of the at least one optical fiber, one or more claddings, surrounding the core, to guide cladding-guided light generated by the one or more light sources along the length of the at least one optical fiber, and a reflector structure machined into the at least one optical fiber. The reflector structure may include multiple angled facets arranged at one or more respective angles relative to an axis of the optical fiber to reflect at least a portion of the core-guided light and/or the cladding-guided light passing through the optical fiber.
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公开(公告)号:US20210060707A1
公开(公告)日:2021-03-04
申请号:US16915373
申请日:2020-06-29
发明人: Long ZHANG , Andreas OEHLER , Jan-Willem PIETERSE
摘要: A Bessel beam laser-cutting system may comprise an ultrafast laser light source, an axicon, a first lens, and a second lens. The ultrafast light source may be configured to emit a beam into the axicon. The axicon may be configured to diffract the beam into a first/primary Bessel beam in a near field of the axicon and an annular beam in a far field of the axicon. The first lens may be configured to focus the annular beam. The second lens may be configured to converge the focused annular beam into a second/secondary Bessel beam to modify a transparent material, wherein a modification depth of the modification generated by the second/secondary Bessel beam is to be within a range of tens of micrometers to several millimeters inside the transparent material.
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