公开(公告)号：US20210060707A1

公开(公告)日：2021-03-04

申请号：US16915373

申请日：2020-06-29

申请人： Lumentum Operations LLC

发明人： Long ZHANG ,  Andreas OEHLER ,  Jan-Willem PIETERSE

IPC分类号： B23K26/38 ,  B23K26/53

摘要： A Bessel beam laser-cutting system may comprise an ultrafast laser light source, an axicon, a first lens, and a second lens. The ultrafast light source may be configured to emit a beam into the axicon. The axicon may be configured to diffract the beam into a first/primary Bessel beam in a near field of the axicon and an annular beam in a far field of the axicon. The first lens may be configured to focus the annular beam. The second lens may be configured to converge the focused annular beam into a second/secondary Bessel beam to modify a transparent material, wherein a modification depth of the modification generated by the second/secondary Bessel beam is to be within a range of tens of micrometers to several millimeters inside the transparent material.