Shielded MOM capacitor
    1.
    发明授权

    公开(公告)号:US10910320B2

    公开(公告)日:2021-02-02

    申请号:US16129751

    申请日:2018-09-12

    Applicant: MEDIATEK INC.

    Inventor: Shi-Bai Chen

    Abstract: A shielded metal-oxide-metal (MOM) capacitor includes a substrate, a lower shielding plate disposed on the substrate and in parallel with a major surface of the substrate, an upper shielding plate situated above the lower shielding plate and in parallel with the lower shielding plate, and a middle plate sandwiched between the lower shielding plate and the upper shielding plate. The middle plate includes two parallel first connecting bars extending along a first direction, a plurality of first fingers extending between the two parallel first connecting bars along a second direction, and an electrode strip spaced apart from and surrounded by the two parallel first connecting bars and the first fingers.

    SHIELDED MOM CAPACITOR
    3.
    发明申请

    公开(公告)号:US20190164903A1

    公开(公告)日:2019-05-30

    申请号:US16129751

    申请日:2018-09-12

    Applicant: MEDIATEK INC.

    Inventor: Shi-Bai Chen

    Abstract: A shielded metal-oxide-metal (MOM) capacitor includes a substrate, a lower shielding plate disposed on the substrate and in parallel with a major surface of the substrate, an upper shielding plate situated above the lower shielding plate and in parallel with the lower shielding plate, and a middle plate sandwiched between the lower shielding plate and the upper shielding plate. The middle plate includes two parallel first connecting bars extending along a first direction, a plurality of first fingers extending between the two parallel first connecting bars along a second direction, and an electrode strip spaced apart from and surrounded by the two parallel first connecting bars and the first fingers.

    INTEGRATED CAPACITOR IN AN INTEGRATED CIRCUIT
    5.
    发明申请
    INTEGRATED CAPACITOR IN AN INTEGRATED CIRCUIT 审中-公开
    集成电路中的集成电容

    公开(公告)号:US20160027772A1

    公开(公告)日:2016-01-28

    申请号:US14337216

    申请日:2014-07-22

    Applicant: MEDIATEK INC.

    Abstract: An integrated capacitor includes a semiconductor substrate comprising a trench isolation area; a first interlayer dielectric (ILD) layer covering the trench isolation area; a first electrode plate comprising at least a first contact layer in the first ILD layer, wherein the contact layer is disposed directly on the trench isolation area; a second electrode plate in the first ILD layer; and a capacitor dielectric structure between the first electrode plate and the second electrode plate.

    Abstract translation: 集成电容器包括:半导体衬底,包括沟槽隔离区域; 覆盖所述沟槽隔离区域的第一层间电介质层(ILD)层; 所述第一电极板包括所述第一ILD层中的至少第一接触层,其中所述接触层直接设置在所述沟槽隔离区域上; 第一ILD层中的第二电极板; 以及在所述第一电极板和所述第二电极板之间的电容器电介质结构。

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