公开(公告)号：US11879024B1

公开(公告)日：2024-01-23

申请号：US17375874

申请日：2021-07-14

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Zachary Perlmutter ,  Tingling Rao ,  Giuseppe Calafiore ,  Emily Anne Makoutz

IPC: C08F222/20 ,  G03F7/004

CPC classification number: C08F222/20 ,  G03F7/0046

Abstract: Disclosed herein is a nanoimprint lithography (NIL) soft mold precursor material comprising a curable fluorinated base resin component, one or more additives, one or more crosslinkers, and one or more of a photo radical generator, a photo acid generator, or both. According to certain embodiments, further disclosed herein are a polymeric material comprising a partially or totally polymerized or crosslinked NIL precursor material, a NIL soft mold comprising the polymeric material, a process for making the NIL soft mold, and a method of using the NIL soft mold to form a NIL grating.