公开(公告)号：US20210175102A1

公开(公告)日：2021-06-10

申请号：US17048489

申请日：2019-04-03

申请人： METRYX LIMITED

发明人： Gregor ELLIOTT ,  Eric TONNIS

IPC分类号： H01L21/67 ,  G01N25/72

摘要： A semiconductor wafer mass metrology apparatus comprising: a measurement chamber for measuring the weight and/or the mass of a semiconductor wafer; a first temperature changing part for changing a temperature of the semiconductor wafer before the semiconductor wafer is transported into the measurement chamber; and a first temperature sensor for sensing a first temperature, wherein the first temperature is: a temperature of the first temperature changing part; or a temperature of the semiconductor wafer when the semiconductor wafer is on the first temperature changing part, or when the semiconductor wafer leaves the first temperature changing part.

公开(公告)号：US20220034708A1

公开(公告)日：2022-02-03

申请号：US17278736

申请日：2019-09-18

申请人： METRYX LIMITED

发明人： Gregor ELLIOTT ,  Eric TONNIS ,  Paul HARRISON ,  Mark BERRY

IPC分类号： G01G23/48 ,  G01J5/00 ,  G05D23/19 ,  H01L21/67

摘要： A semiconductor wafer mass metrology method comprising: controlling the temperature of a semiconductor wafer by: detecting information relating to the temperature of the semiconductor wafer; and controlling cooling or heating of the semiconductor wafer based on the detected information relating to the temperature of the semiconductor wafer; wherein controlling the cooling or heating of the semiconductor wafer comprises controlling a duration of the cooling or heating of the semiconductor wafer; and subsequently loading the semiconductor wafer onto a measurement area of a semiconductor wafer mass metrology apparatus.