LASER ADJUSTMENT METHOD AND LASER SOURCE DEVICE

    公开(公告)号:US20170373463A1

    公开(公告)日:2017-12-28

    申请号:US15617307

    申请日:2017-06-08

    Abstract: A laser adjustment method includes a first adjustment step and a second adjustment step. In the first adjustment step, using a light detector detecting a second harmonic light, optical intensity and wavelength of the second harmonic light is detected and a first temperature adjuster is adjusted to adjust temperatures of a Nd:YVO4 crystal and a KTP crystal such that the detected wavelength of the second harmonic light approaches a desired wavelength and such that the optical intensity of the second harmonic light reaches at least a predetermined value. In the second adjustment step, after the first adjustment step, a temperature of an etalon is adjusted by a second temperature adjuster such that the detected wavelength of the second harmonic light approaches the desired wavelength and such that the optical intensity of the second harmonic light reaches at least a predetermined value.

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