公开(公告)号：US20040116548A1

公开(公告)日：2004-06-17

申请号：US10318273

申请日：2002-12-12

Applicant: MOLECULAR IMPRINTS, INC.

Inventor： C. Grant Willson ,  Nicholas A. Stacey

IPC: B29C035/08 ,  C08J003/28

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0757

Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.

Abstract translation: 本发明提供了一种组合物及其使用方法，该组合物及其方法使用使用暗场聚合的压印光刻法在基材上形成图案。 为此，组合物包括双乙烯基醚组分和响应于辐射产生酸的引发剂组分。 双乙烯基醚组分与酸反应并响应于此聚合。

公开(公告)号：US20040112862A1

公开(公告)日：2004-06-17

申请号：US10318319

申请日：2002-12-12

Applicant: MOLECULAR IMPRINTS, INC.

Inventor： C. Grant Willson ,  Britain J. Smith ,  Nicholas A. Stacey

IPC: C23F001/00

CPC classification number: B29C43/003 ,  B29C2043/025 ,  B81C99/0085 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0955

Abstract: The present invention includes a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. To that end, in one embodiment of the present invention the composition includes a non-silicon-containing acrylate component, and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps. The initiator component is responsive to radiation to initiate a free radical reaction and cause the non-silicon containing acrylate component to polymerize and cross-link. One embodiment of the non-silicon-containing acrylate component includes ethylene glycol diacrylate. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.

Abstract translation: 本发明包括通过在将组合物暴露于辐射时从组合物形成交联聚合物而在组合物上形成图案的组合物和方法。 为此，在本发明的一个实施方案中，组合物包含非含硅丙烯酸酯组分和与所述非含硅丙烯酸酯组合的引发剂组分，以提供不大于5cps的粘度。 引发剂组分响应辐射以引发自由基反应，并使非含硅丙烯酸酯组分聚合和交联。 非含硅丙烯酸酯组分的一个实施方案包括乙二醇二丙烯酸酯。 该方法包括沉积作为平坦化层的组合物。 此后，沉积要记录图案的可聚合材料层。